Inventor
LEAVITT CHRISTOPHER J
US16 patents
⚠️ This page may combine multiple inventors who share the name “LEAVITT CHRISTOPHER J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC
5 patentsUS10290466B2May 14, 2019
Boron implanting using a co-gas
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC1 citations72
US9865430B2Jan 9, 2018
Boron implanting using a co-gas
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC3 citations72
US9840772B2Dec 12, 2017
Method of improving ion beam quality in a non-mass-analyzed ion implantation system
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC2 citations72
US9711316B2Jul 18, 2017
Method of cleaning an extraction electrode assembly using pulsed biasing
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC4 citations72
US9677171B2Jun 13, 2017
Method of improving ion beam quality in a non-mass-analyzed ion implantation system
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC2 citations72
VARIAN SEMICONDUCTOR EQUIPMENT
4 patentsUS8354655B2Jan 15, 2013
Method and system for controlling critical dimension and roughness in resist features
VARIAN SEMICONDUCTOR EQUIPMENT7 citations84
US8669538B1Mar 11, 2014
Method of improving ion beam quality in an implant system
VARIAN SEMICONDUCTOR EQUIPMENT3 citations62
US9034743B2May 19, 2015
Method for implant productivity enhancement
VARIAN SEMICONDUCTOR EQUIPMENT3 citations61
US8698109B2Apr 15, 2014
Method and system for controlling critical dimension and roughness in resist features
VARIAN SEMICONDUCTOR EQUIPMENT0 citations52
APPLIED MATERIALS INC
3 patentsUS11615945B2Mar 28, 2023
Plasma processing apparatus and techniques
APPLIED MATERIALS INC0 citations59
US11120973B2Sep 14, 2021
Plasma processing apparatus and techniques
APPLIED MATERIALS INC0 citations59
US12165852B2Dec 10, 2024
Cover ring to mitigate carbon contamination in plasma doping chamber
APPLIED MATERIALS INC0 citations50