Inventor
SANKARAKRISHNAN RAMPRAKASH
US34 patents
⚠️ This page may combine multiple inventors who share the name “SANKARAKRISHNAN RAMPRAKASH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
31 patentsUS9157730B2Oct 13, 2015
PECVD process
APPLIED MATERIALS INC49 citations97
US9816187B2Nov 14, 2017
PECVD process
APPLIED MATERIALS INC8 citations92
US9458537B2Oct 4, 2016
PECVD process
APPLIED MATERIALS INC12 citations92
US10793954B2Oct 6, 2020
PECVD process
APPLIED MATERIALS INC3 citations84
US10060032B2Aug 28, 2018
PECVD process
APPLIED MATERIALS INC3 citations84
US9725806B2Aug 8, 2017
Multi-zone pedestal for plasma processing
APPLIED MATERIALS INC7 citations84
US11613812B2Mar 28, 2023
PECVD process
APPLIED MATERIALS INC2 citations73
US10125422B2Nov 13, 2018
High impedance RF filter for heater with impedance tuning device
APPLIED MATERIALS INC4 citations73
US10128118B2Nov 13, 2018
Bottom and side plasma tuning having closed loop control
APPLIED MATERIALS INC2 citations73
US9922819B2Mar 20, 2018
Wafer rotation in a semiconductor chamber
APPLIED MATERIALS INC2 citations72
US9593419B2Mar 14, 2017
Wafer rotation in a semiconductor chamber
APPLIED MATERIALS INC2 citations71
US10094486B2Oct 9, 2018
Method and system for supplying a cleaning gas into a process chamber
APPLIED MATERIALS INC1 citations63
US10090187B2Oct 2, 2018
Multi-zone pedestal for plasma processing
APPLIED MATERIALS INC1 citations63
US11898249B2Feb 13, 2024
PECVD process
APPLIED MATERIALS INC0 citations62
US10971389B2Apr 6, 2021
Multi-zone pedestal for plasma processing
APPLIED MATERIALS INC0 citations62
US10910227B2Feb 2, 2021
Bottom and side plasma tuning having closed loop control
APPLIED MATERIALS INC0 citations62
US10450653B2Oct 22, 2019
High impedance RF filter for heater with impedance tuning device
APPLIED MATERIALS INC1 citations62
US10290459B2May 14, 2019
Magnetron having enhanced cooling characteristics
APPLIED MATERIALS INC1 citations62
US10030306B2Jul 24, 2018
PECVD apparatus and process
APPLIED MATERIALS INC1 citations62
US7699935B2Apr 20, 2010
Method and system for supplying a cleaning gas into a process chamber
APPLIED MATERIALS INC3 citations62
US10811301B2Oct 20, 2020
Dual-zone heater for plasma processing
APPLIED MATERIALS INC0 citations52
US10544508B2Jan 28, 2020
Controlling temperature in substrate processing systems
APPLIED MATERIALS INC0 citations52
US10497606B2Dec 3, 2019
Dual-zone heater for plasma processing
APPLIED MATERIALS INC0 citations52
US10385448B2Aug 20, 2019
Apparatus and method for purging gaseous compounds
APPLIED MATERIALS INC0 citations52
US10370764B2Aug 6, 2019
Isolator for a substrate processing chamber
APPLIED MATERIALS INC0 citations52
US10161035B2Dec 25, 2018
Apparatus and method for purging gaseous compounds
APPLIED MATERIALS INC0 citations52
US10141153B2Nov 27, 2018
Magnetron having enhanced cooling characteristics
APPLIED MATERIALS INC0 citations52
US9428424B2Aug 30, 2016
Critical chamber component surface improvement to reduce chamber particles
APPLIED MATERIALS INC1 citations52
US9206511B2Dec 8, 2015
Method and system for supplying a cleaning gas into a process chamber
APPLIED MATERIALS INC0 citations52
US10510518B2Dec 17, 2019
Methods of dry stripping boron-carbon films
APPLIED MATERIALS INC0 citations51
US10541159B2Jan 21, 2020
Processing chamber with irradiance curing lens
APPLIED MATERIALS INC0 citations40