Inventor

GUNG TZA-JING

US59 patents

⚠️ This page may combine multiple inventors who share the name “GUNG TZA-JING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GUNG TZA-JING

APPLIED MATERIALS INC

Shields usable with an inductively coupled plasma reactor

Sidewall magnet improving uniformity of inductively coupled plasma and shields used therewith

Selectable dual position magnetron

Tubular magnet as center pole in unbalanced sputtering magnetron

Auxiliary in-plane magnet inside a nested unbalanced magnetron

Auxiliary vertical magnet outside a nested unbalanced magnetron

Electrostatic chuck with variable pixelated magnetic field

Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactors

Tunable magnetic field to improve uniformity

Method and apparatus for controlling a magnetic field in a plasma chamber

Pressure switched dual magnetron

Magnetron having continuously variable radial position

Multi-step process for forming a metal barrier in a sputter reactor

Position controlled dual magnetron

Variable quadruple electromagnet array in plasma processing

Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry

Cleaning of sin with CCP plasma or RPS clean

High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process

Sputtering showerhead

Dry etch rate reduction of silicon nitride films

Method and apparatus for controlling a magnetic field in a plasma chamber

Electromagnetic dipole for plasma density tuning in a substrate processing chamber

Directional selective junction clean with field polymer protections

Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability

Film stack overlay improvement

Cleaning of SIN with CCP plasma or RPS clean

Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions

Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions

Electrostatic chuck with variable pixelated magnetic field

Magnetic housing systems

Directional selective junction clean with field polymer protections

Silicon-containing layer for bit line resistance reduction

Silicon-containing layer for bit line resistance reduction

Magnetic housing systems

Analyzing in-plane distortion

Methods and apparatus for processing a substrate

Analyzing in-plane distortion

Batch processing chambers for plasma-enhanced deposition

Single oxide metal deposition chamber

Dual radio-frequency tuner for process control of a plasma process

Sputtering target for PVD chamber

High density TiN RF/DC PVD deposition with stress tuning

Magnetron design for extended target life in radio frequency (RF) plasmas

On stack overlay improvement for 3D NAND

Oxide with higher utilization and lower cost

MILLER KEITH A

Mechanism for continuously varying radial position of a magnetron

GUNG TZA-JING

Electromagnet array in a sputter reactor

LEE JOUNG JOO

Methods for forming interconnect structures

HA TAE HONG

Methods of forming layers on substrates

LIU ZHENDONG

Sputtering target for PVD chamber