Inventor
LE VAN H
US234 patents
⚠️ This page may combine multiple inventors who share the name “LE VAN H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INTEL CORP
35 patentsUS9472613B2Oct 18, 2016
Conversion of strain-inducing buffer to electrical insulator
INTEL CORP13 citations93
US11362215B2Jun 14, 2022
Top-gate doped thin film transistor
INTEL CORP6 citations86
US11264512B2Mar 1, 2022
Thin film transistors having U-shaped features
INTEL CORP6 citations86
US10763349B2Sep 1, 2020
Quantum dot devices with modulation doped stacks
INTEL CORP18 citations86
US11289490B2Mar 29, 2022
Vertical 1T-1C DRAM array
INTEL CORP5 citations84
US11138499B2Oct 5, 2021
Applications of back-end-of-line (BEOL) capacitors in compute-in-memory (CIM) circuits
INTEL CORP5 citations84
US10418487B2Sep 17, 2019
Non-planar gate all-around device and method of fabrication thereof
INTEL CORP9 citations84
US10249740B2Apr 2, 2019
Ge nano wire transistor with GaAs as the sacrificial layer
INTEL CORP7 citations84
US10186580B2Jan 22, 2019
Semiconductor device having germanium active layer with underlying diffusion barrier layer
INTEL CORP5 citations84
US10096709B2Oct 9, 2018
Aspect ratio trapping (ART) for fabricating vertical semiconductor devices
INTEL CORP7 citations84
US10038054B2Jul 31, 2018
Variable gate width for gate all-around transistors
INTEL CORP14 citations84
US10026845B2Jul 17, 2018
Deep gate-all-around semiconductor device having germanium or group III-V active layer
INTEL CORP5 citations84
US9691843B2Jun 27, 2017
Common-substrate semiconductor devices having nanowires or semiconductor bodies with differing material orientation or composition
INTEL CORP7 citations84
US9570614B2Feb 14, 2017
Ge and III-V channel semiconductor devices having maximized compliance and free surface relaxation
INTEL CORP14 citations84
US9391181B2Jul 12, 2016
Lattice mismatched hetero-epitaxial film
INTEL CORP10 citations84
US9306068B2Apr 5, 2016
Stain compensation in transistors
INTEL CORP7 citations84
US10847656B2Nov 24, 2020
Fabrication of non-planar IGZO devices for improved electrostatics
INTEL CORP6 citations82
US12245523B2Mar 4, 2025
Quantum dot devices with fins
INTEL CORP1 citations75
US12057402B2Aug 6, 2024
Direct bonding in microelectronic assemblies
INTEL CORP3 citations75
US11658208B2May 23, 2023
Thin film transistors for high voltage applications
INTEL CORP4 citations75
US12381193B2Aug 5, 2025
Integrated circuit assemblies
INTEL CORP2 citations74
US12148734B2Nov 19, 2024
Transistors, memory cells, and arrangements thereof
INTEL CORP3 citations73
US11862730B2Jan 2, 2024
Top-gate doped thin film transistor
INTEL CORP2 citations73
US11699681B2Jul 11, 2023
Multi-chip module having a stacked logic chip and memory stack
INTEL CORP2 citations73
US11538808B2Dec 27, 2022
Structures and methods for memory cells
INTEL CORP4 citations73
US11522059B2Dec 6, 2022
Metallic sealants in transistor arrangements
INTEL CORP2 citations73
US11462541B2Oct 4, 2022
Memory cells based on vertical thin-film transistors
INTEL CORP2 citations73
US11417775B2Aug 16, 2022
Nanowire thin film transistors with textured semiconductors
INTEL CORP2 citations73
US11417770B2Aug 16, 2022
Vertical thin-film transistors between metal layers
INTEL CORP5 citations73
US11411119B2Aug 9, 2022
Double gated thin film transistors
INTEL CORP3 citations73
US11398560B2Jul 26, 2022
Contact electrodes and dielectric structures for thin film transistors
INTEL CORP3 citations73
US11387399B2Jul 12, 2022
Quantum dot devices with back gates
INTEL CORP2 citations73
US11348973B2May 31, 2022
Threshold switching selector based memory
INTEL CORP2 citations73
US11309400B2Apr 19, 2022
Stacked thin film transistors with nanowires
INTEL CORP2 citations73
US11251227B2Feb 15, 2022
Fully self-aligned cross grid vertical memory array
INTEL CORP3 citations73
PILLARISETTY RAVI
7 patentsUS8765563B2Jul 1, 2014
Trench confined epitaxially grown device layer(s)
PILLARISETTY RAVI42 citations98
US9634007B2Apr 25, 2017
Trench confined epitaxially grown device layer(s)
PILLARISETTY RAVI16 citations93
US9123790B2Sep 1, 2015
Contact techniques and configurations for reducing parasitic resistance in nanowire transistors
PILLARISETTY RAVI24 citations93
US9337291B2May 10, 2016
Deep gate-all-around semiconductor device having germanium or group III-V active layer
PILLARISETTY RAVI9 citations84
US9236476B2Jan 12, 2016
Techniques and configuration for stacking transistors of an integrated circuit device
PILLARISETTY RAVI6 citations84
US9136343B2Sep 15, 2015
Deep gate-all-around semiconductor device having germanium or group III-V active layer
PILLARISETTY RAVI9 citations84
US8710490B2Apr 29, 2014
Semiconductor device having germanium active layer with underlying parasitic leakage barrier layer
PILLARISETTY RAVI8 citations84
RACHMADY WILLY
4 patentsUS8987794B2Mar 24, 2015
Non-planar gate all-around device and method of fabrication thereof
RACHMADY WILLY65 citations98
US8748940B1Jun 10, 2014
Semiconductor devices with germanium-rich active layers and doped transition layers
RACHMADY WILLY35 citations97
US9590089B2Mar 7, 2017
Variable gate width for gate all-around transistors
RACHMADY WILLY18 citations93
US8575653B2Nov 5, 2013
Non-planar quantum well device having interfacial layer and method of forming same
RACHMADY WILLY21 citations93
MARK IV IND LTD
2 patentsCAPPELLANI ANNALISA
1 patentGOEL NITI
1 patentShowing the top 50 of 234 patents by PatentIndex Score.