Inventor
HAFEZ WALID M
US144 patents
⚠️ This page may combine multiple inventors who share the name “HAFEZ WALID M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INTEL CORP
40 patentsUS7943468B2May 17, 2011
Penetrating implant for forming a semiconductor device
INTEL CORP20 citations92
US11335601B2May 17, 2022
Non-planar I/O and logic semiconductor devices having different workfunction on common substrate
INTEL CORP6 citations85
US10096599B2Oct 9, 2018
Methods of integrating multiple gate dielectric transistors on a tri-gate (finFET) process
INTEL CORP7 citations84
US9972642B2May 15, 2018
High voltage three-dimensional devices having dielectric liners
INTEL CORP5 citations84
US9929090B2Mar 27, 2018
Antifuse element using spacer breakdown
INTEL CORP7 citations84
US9899472B2Feb 20, 2018
Dielectric and isolation lower fin material for fin-based electronics
INTEL CORP4 citations84
US9786783B2Oct 10, 2017
Transistor architecture having extended recessed spacer and source/drain regions and method of making same
INTEL CORP16 citations84
US8681573B2Mar 25, 2014
Programmable/re-programmable device in high-k metal gate MOS
INTEL CORP5 citations84
US11094782B1Aug 17, 2021
Gate-all-around integrated circuit structures having depopulated channel structures
INTEL CORP8 citations83
US10892192B2Jan 12, 2021
Non-planar I/O and logic semiconductor devices having different workfunction on common substrate
INTEL CORP5 citations83
US10692771B2Jun 23, 2020
Non-planar I/O and logic semiconductor devices having different workfunction on common substrate
INTEL CORP4 citations83
US10229853B2Mar 12, 2019
Non-planar I/O and logic semiconductor devices having different workfunction on common substrate
INTEL CORP4 citations83
US10115721B2Oct 30, 2018
Planar device on fin-based transistor architecture
INTEL CORP5 citations83
US9356023B2May 31, 2016
Planar device on fin-based transistor architecture
INTEL CORP5 citations83
US10204999B2Feb 12, 2019
Transistor with airgap spacer
INTEL CORP8 citations82
US9502883B2Nov 22, 2016
Extended drain non-planar MOSFETs for electrostatic discharge (ESD) protection
INTEL CORP7 citations81
US11387328B2Jul 12, 2022
III-N tunnel device architectures and high frequency mixers employing a III-N tunnel device
INTEL CORP6 citations75
US12369358B2Jul 22, 2025
Co-integrated high performance nanoribbon transistors with high voltage thick gate finFET devices
INTEL CORP2 citations73
US11588037B2Feb 21, 2023
Planar transistors with wrap-around gates and wrap-around source and drain contacts
INTEL CORP2 citations73
US11538804B2Dec 27, 2022
Stacked integration of III-N transistors and thin-film transistors
INTEL CORP2 citations73
US11444171B2Sep 13, 2022
Self-aligned gate endcap (SAGE) architecture having gate or contact plugs
INTEL CORP2 citations73
US11424245B2Aug 23, 2022
Self-aligned gate endcap (SAGE) architecture having gate contacts
INTEL CORP3 citations73
US10950606B2Mar 16, 2021
Dual fin endcap for self-aligned gate edge (SAGE) architectures
INTEL CORP2 citations73
US10707346B2Jul 7, 2020
High-voltage transistor with self-aligned isolation
INTEL CORP3 citations73
US10020313B2Jul 10, 2018
Antifuse with backfilled terminals
INTEL CORP3 citations73
US9881927B2Jan 30, 2018
CMOS-compatible polycide fuse structure and method of fabricating same
INTEL CORP3 citations73
US9780217B2Oct 3, 2017
Non-planar semiconductor device having self-aligned fin with top blocking layer
INTEL CORP3 citations73
US9748252B2Aug 29, 2017
Antifuse element utilizing non-planar topology
INTEL CORP3 citations73
US11823954B2Nov 21, 2023
Non-planar I/O and logic semiconductor devices having different workfunction on common substrate
INTEL CORP2 citations72
US11437483B2Sep 6, 2022
Gate-all-around integrated circuit structures having dual nanoribbon channel structures
INTEL CORP2 citations72
US11276760B2Mar 15, 2022
Non-planar semiconductor device having omega-fin with doped sub-fin region and method to fabricate same
INTEL CORP2 citations72
US11217582B2Jan 4, 2022
Unidirectional self-aligned gate endcap (SAGE) architectures with gate-orthogonal walls
INTEL CORP2 citations72
US10756210B2Aug 25, 2020
Depletion mode gate in ultrathin FINFET based architecture
INTEL CORP3 citations72
US10229866B2Mar 12, 2019
On-chip through-body-via capacitors and techniques for forming same
INTEL CORP4 citations72
US9947585B2Apr 17, 2018
Multi-gate transistor with variably sized fin
INTEL CORP5 citations72
US11289483B2Mar 29, 2022
Metal fuse and self-aligned gate edge (SAGE) architecture having a metal fuse
INTEL CORP2 citations68
US12389626B2Aug 12, 2025
High-voltage transistor with self-aligned isolation
INTEL CORP0 citations63
US12249622B2Mar 11, 2025
Nanoribbon thick gate devices with differential ribbon spacing and width for SOC applications
INTEL CORP1 citations63
US11670637B2Jun 6, 2023
Logic circuit with indium nitride quantum well
INTEL CORP1 citations63
US11139370B2Oct 5, 2021
Dielectric and isolation lower fin material for fin-based electronics
INTEL CORP0 citations63
HAFEZ WALID M
5 patentsUS8432751B2Apr 30, 2013
Memory cell using BTI effects in high-k metal gate MOS
HAFEZ WALID M187 citations98
US9159734B2Oct 13, 2015
Antifuse element utilizing non-planar topology
HAFEZ WALID M21 citations92
US8981481B2Mar 17, 2015
High voltage three-dimensional devices having dielectric liners
HAFEZ WALID M12 citations92
US9570467B2Feb 14, 2017
High voltage three-dimensional devices having dielectric liners
HAFEZ WALID M3 citations83
US8101471B2Jan 24, 2012
Method of forming programmable anti-fuse element
HAFEZ WALID M8 citations79
YEH JENG-YA D
2 patentsAHSAN AKM
1 patentTSAI CURTIS
1 patentTAHOE RES LTD
1 patentShowing the top 50 of 144 patents by PatentIndex Score.