Inventor
NAGAI TOMOKI
JP50 patents
⚠️ This page may combine multiple inventors who share the name “NAGAI TOMOKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
37 patentsUS6908722B2Jun 21, 2005
Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition
JSR CORP200 citations98
US7897821B2Mar 1, 2011
Sulfonium compound
JSR CORP15 citations92
US7812105B2Oct 12, 2010
Compound, polymer, and radiation-sensitive composition
JSR CORP25 citations92
US6933094B2Aug 23, 2005
Radiation-sensitive resin composition
JSR CORP17 citations92
US7956142B2Jun 7, 2011
Polymerizable sulfonic acid onium salt and resin
JSR CORP9 citations83
US6821705B2Nov 23, 2004
Radiation-sensitive resin composition
JSR CORP11 citations73
US10018911B2Jul 10, 2018
Chemically amplified resist material and resist pattern-forming method
JSR CORP4 citations72
US9587065B2Mar 7, 2017
Composition for pattern formation, and pattern-forming method
JSR CORP2 citations72
US11426761B2Aug 30, 2022
Modification method of surface of base, composition, and polymer
JSR CORP2 citations71
US10308752B2Jun 4, 2019
Block copolymer
JSR CORP1 citations71
US9684235B2Jun 20, 2017
Directed self-assembling composition for pattern formation, and pattern-forming method
JSR CORP2 citations71
US6830868B2Dec 14, 2004
Anthracene derivative and radiation-sensitive resin composition
JSR CORP3 citations63
US8026039B2Sep 27, 2011
Radiation-sensitive resin composition
JSR CORP2 citations62
US7202016B2Apr 10, 2007
Radiation-sensitive resin composition
JSR CORP4 citations62
US7335457B2Feb 26, 2008
Positive-tone radiation-sensitive resin composition
JSR CORP2 citations61
US6846607B2Jan 25, 2005
Carbazole derivative and chemically amplified radiation-sensitive resin composition
JSR CORP2 citations61
US10995173B2May 4, 2021
Composition and pattern-forming method
JSR CORP0 citations60
US7488566B2Feb 10, 2009
Positive type radiation-sensitive resin composition
JSR CORP2 citations60
US9738746B2Aug 22, 2017
Composition for pattern formation, pattern-forming method, and block copolymer
JSR CORP0 citations52
US11335559B2May 17, 2022
Pattern-forming method, and composition
JSR CORP0 citations51
US11204552B2Dec 21, 2021
Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent
JSR CORP0 citations51
US10146130B2Dec 4, 2018
Composition for base, and directed self-assembly lithography method
JSR CORP0 citations51
US9989849B2Jun 5, 2018
Chemically amplified resist material and resist pattern-forming method
JSR CORP1 citations51
US9690192B2Jun 27, 2017
Composition for base, and directed self-assembly lithography method
JSR CORP0 citations51
US9599892B2Mar 21, 2017
Composition for pattern formation, and pattern-forming method
JSR CORP0 citations51
US11525067B2Dec 13, 2022
Modification method of substrate surface, and composition and polymer
JSR CORP0 citations50
US11462405B2Oct 4, 2022
Pattern-forming method and patterned substrate
JSR CORP0 citations50
US9718950B2Aug 1, 2017
Directed self-assembly composition for pattern formation and pattern-forming method
JSR CORP1 citations49
US12542199B2Feb 3, 2026
Data processing method, data processing device, and data processing system
JSR CORP0 citations43
US7258962B2Aug 21, 2007
Positive-tone radiation-sensitive resin composition
JSR CORP0 citations42
US10120282B2Nov 6, 2018
Chemically amplified resist material and resist pattern-forming method
JSR CORP0 citations41
US9939729B2Apr 10, 2018
Resist pattern-forming method
JSR CORP0 citations41
US9534135B2Jan 3, 2017
Composition for pattern formation, and pattern-forming method
JSR CORP0 citations41
US9557644B2Jan 31, 2017
Base film-forming composition, and directed self-assembly lithography method
JSR CORP0 citations40
US9487868B2Nov 8, 2016
Pattern-forming method
JSR CORP0 citations40
US7314701B2Jan 1, 2008
Radiation-sensitive resin composition
JSR CORP0 citations37
US7105269B2Sep 12, 2006
Copolymer, polymer mixture, and radiation-sensitive resin composition
JSR CORP0 citations37
UNIV OSAKA
3 patentsUS10073349B2Sep 11, 2018
Chemically amplified resist material, pattern-forming method, compound, and production method of compound
UNIV OSAKA2 citations62
US10073348B2Sep 11, 2018
Resist-pattern-forming method and chemically amplified resist material
UNIV OSAKA0 citations41
US9971247B2May 15, 2018
Pattern-forming method
UNIV OSAKA0 citations41