Inventor
NARUOKA TAKEHIKO
JP30 patents
⚠️ This page may combine multiple inventors who share the name “NARUOKA TAKEHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
22 patentsUS10018911B2Jul 10, 2018
Chemically amplified resist material and resist pattern-forming method
JSR CORP4 citations72
US9587065B2Mar 7, 2017
Composition for pattern formation, and pattern-forming method
JSR CORP2 citations72
US11705331B2Jul 18, 2023
Method and composition for selectively modifying base material surface
JSR CORP0 citations62
US11370872B2Jun 28, 2022
Composition for pattern formation, and pattern-forming method
JSR CORP0 citations62
US11211246B2Dec 28, 2021
Method and composition for selectively modifying base material surface
JSR CORP0 citations62
US10950438B2Mar 16, 2021
Method and composition for selectively modifying base material surface
JSR CORP0 citations62
US9738746B2Aug 22, 2017
Composition for pattern formation, pattern-forming method, and block copolymer
JSR CORP0 citations52
US11460767B2Oct 4, 2022
Composition for film formation, film-forming method and directed self-assembly lithography process
JSR CORP0 citations51
US11335559B2May 17, 2022
Pattern-forming method, and composition
JSR CORP0 citations51
US11204552B2Dec 21, 2021
Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent
JSR CORP0 citations51
US10146130B2Dec 4, 2018
Composition for base, and directed self-assembly lithography method
JSR CORP0 citations51
US9989849B2Jun 5, 2018
Chemically amplified resist material and resist pattern-forming method
JSR CORP1 citations51
US9690192B2Jun 27, 2017
Composition for base, and directed self-assembly lithography method
JSR CORP0 citations51
US9599892B2Mar 21, 2017
Composition for pattern formation, and pattern-forming method
JSR CORP0 citations51
US10691019B2Jun 23, 2020
Pattern-forming method and composition
JSR CORP0 citations41
US10120282B2Nov 6, 2018
Chemically amplified resist material and resist pattern-forming method
JSR CORP0 citations41
US9939729B2Apr 10, 2018
Resist pattern-forming method
JSR CORP0 citations41
US9534135B2Jan 3, 2017
Composition for pattern formation, and pattern-forming method
JSR CORP0 citations41
US10725376B2Jul 28, 2020
Pattern-forming method
JSR CORP0 citations40
US9557644B2Jan 31, 2017
Base film-forming composition, and directed self-assembly lithography method
JSR CORP0 citations40
US9487868B2Nov 8, 2016
Pattern-forming method
JSR CORP0 citations40
US10520815B2Dec 31, 2019
Pattern-forming method
JSR CORP0 citations38
UNIV OSAKA
3 patentsUS10073349B2Sep 11, 2018
Chemically amplified resist material, pattern-forming method, compound, and production method of compound
UNIV OSAKA2 citations62
US10073348B2Sep 11, 2018
Resist-pattern-forming method and chemically amplified resist material
UNIV OSAKA0 citations41
US9971247B2May 15, 2018
Pattern-forming method
UNIV OSAKA0 citations41