Inventor
MARUYAMA KEN
JP32 patents
⚠️ This page may combine multiple inventors who share the name “MARUYAMA KEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
19 patentsUS9023584B2May 5, 2015
Radiation-sensitive composition, and compound
JSR CORP8 citations83
US9128370B2Sep 8, 2015
Radiation-sensitive composition and compound
JSR CORP4 citations72
US9122154B2Sep 1, 2015
Radiation-sensitive resin composition, and radiation-sensitive acid generating agent
JSR CORP5 citations72
US11592746B2Feb 28, 2023
Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid
JSR CORP4 citations70
US11609495B2Mar 21, 2023
Radiation-sensitive resin composition and resist pattern-forming method
JSR CORP3 citations69
US7977442B2Jul 12, 2011
Radiation-sensitive composition, polymer and monomer
JSR CORP2 citations63
US12422748B2Sep 23, 2025
Radiation-sensitive resin composition and method for forming resist pattern
JSR CORP0 citations62
US11747725B2Sep 5, 2023
Radiation-sensitive resin composition and method for forming resist pattern
JSR CORP1 citations62
US8377627B2Feb 19, 2013
Compound and radiation-sensitive composition
JSR CORP2 citations62
US11204552B2Dec 21, 2021
Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent
JSR CORP0 citations51
US9304393B2Apr 5, 2016
Radiation-sensitive resin composition and compound
JSR CORP1 citations51
US8809476B2Aug 19, 2014
Polymer
JSR CORP0 citations51
US12092957B2Sep 17, 2024
Radiation-sensitive resin composition, method for forming resist pattern and compound
JSR CORP0 citations48
US11966161B2Apr 23, 2024
Radiation-sensitive resin composition, method of forming resist pattern, and compound
JSR CORP0 citations48
US11319388B2May 3, 2022
Radiation-sensitive resin composition, production method thereof, and resist pattern-forming method
JSR CORP0 citations47
US11745216B2Sep 5, 2023
Method for producing film
JSR CORP0 citations45
US8889336B2Nov 18, 2014
Radiation-sensitive resin composition and radiation-sensitive acid generating agent
JSR CORP0 citations41
US8889335B2Nov 18, 2014
Radiation-sensitive resin composition
JSR CORP0 citations41
US10216090B2Feb 26, 2019
Pattern-forming method and composition for resist pattern-refinement
JSR CORP0 citations32
MARUYAMA KEN
7 patentsUS8389202B2Mar 5, 2013
Polymer, radiation-sensitive composition, monomer, and method of producing compound
MARUYAMA KEN2 citations62
US9200098B2Dec 1, 2015
Radiation-sensitive composition and compound
MARUYAMA KEN3 citations61
US8632945B2Jan 21, 2014
Radiation-sensitive resin composition, monomer, polymer, and production method of radiation-sensitive resin composition
MARUYAMA KEN2 citations61
US8968980B2Mar 3, 2015
Radiation-sensitive resin composition and compound
MARUYAMA KEN2 citations58
US9120726B2Sep 1, 2015
Radiation-sensitive resin composition, compound and producing method of compound
MARUYAMA KEN0 citations51
US8334087B2Dec 18, 2012
Polymer, radiation-sensitive composition, monomer, and method of producing compound
MARUYAMA KEN0 citations50
US9052600B2Jun 9, 2015
Method for forming resist pattern and composition for forming protective film
MARUYAMA KEN1 citations43