Inventor

WILLWERTH MICHAEL D

US52 patents

⚠️ This page may combine multiple inventors who share the name “WILLWERTH MICHAEL D”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WILLWERTH MICHAEL D

APPLIED MATERIALS INC

Substrate support pedestal

Method and apparatus for stable plasma processing

High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck

Method and apparatus for performing limited area spectral analysis

Electrostatic chuck with variable pixelated magnetic field

Substrate support assembly

Substrate support assembly having rapid temperature control

Apparatus and methods for reducing particles in semiconductor process chambers

Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection

Cathode liner with wafer edge gas injection in a plasma reactor chamber

Method and apparatus for performing limited area spectral analysis

Substrate lift pin actuator

Gas distribution plate with UV blocker

Sensors and system for in-situ edge ring erosion monitor

Method and apparatus for stable plasma processing

Gas flow for condensation reduction with a substrate processing chuck

Spatial optical emission spectroscopy for etch uniformity

Cooling element for an electrostatic chuck assembly

High temperature electrostatic chuck with real-time heat zone regulating capability

Gas distribution plate with UV blocker at the center

Electrostatic chuck with variable pixelated magnetic field

Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection

Spatial optical emission spectroscopy for etch uniformity

Capacitive sensor housing for chamber condition monitoring

Capacitive sensor housing for chamber condition monitoring

Conductive wafer lift pin o-ring gripper with resistor

Chamber lid with integrated heater

Processing chamber with substrate edge enhancement processing

Low sloped edge ring for plasma processing chamber

Method and apparatus for performing limited area spectral analysis

Capacitive sensing data integration for plasma chamber condition monitoring

Capacitive sensing data integration for plasma chamber condition monitoring

Shielded lid heater assembly

Capacitive sensors and capacitive sensing locations for plasma chamber condition monitoring

Gas flow for condensation reduction with a substrate processing chuck

Resonant process monitor

Apparatus and methods for reducing particles in semiconductor process chambers

Capacitive sensor for chamber condition monitoring

Fast gas exchange apparatus, system, and method

WILLWERTH MICHAEL D

Electrostatic chuck with reduced arcing

Shielded lid heater assembly

Low force substrate lift

Shielded lid heater assembly

PALAGASHVILI DAVID

Chamber with uniform flow and plasma distribution

Apparatus for controlling the flow of a gas in a process chamber

MATYUSHKIN ALEXANDER

Substrate processing with rapid temperature gradient control

BALAKRISHNA AJIT

Gas flow equalizer plate suitable for use in a substrate process chamber

TODOROW VALENTIN N

Field enhanced inductively coupled plasma (Fe-ICP) reactor

LEE CHANGHUN

Low sloped edge ring for plasma processing chamber

LIU WEI

Methods for high temperature etching a high-K material gate structure