Inventor
HSIEH BO-WEN
TW14 patents
Patents
14 patentsUS11296201B2Apr 5, 2022
Gate structure and method of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations83
US11038035B2Jun 15, 2021
Semiconductor structure with enlarged gate electrode structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations81
US10686049B2Jun 16, 2020
Gate structure and method of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US11018234B2May 25, 2021
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations71
US11996453B2May 28, 2024
Introducing fluorine to gate after work function metal deposition
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations70
US9748350B2Aug 29, 2017
Semiconductor structure with enlarged gate electrode structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations70
US12507461B2Dec 23, 2025
Semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12015068B2Jun 18, 2024
Gate structure and method of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11848367B2Dec 19, 2023
Method for manufacturing semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10008574B2Jun 26, 2018
Gate structure and method of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US12426332B2Sep 23, 2025
Introducing fluorine to gate after work function metal deposition
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12191366B2Jan 7, 2025
Semiconductor structure with enlarged gate electrode structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US10312338B2Jun 4, 2019
Gate structure and method of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10141416B2Nov 27, 2018
Semiconductor structure with enlarged gate electrode structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49