Inventor
SAWAMURA TAKASHI
JP15 patents
Patents
15 patentsUS11676814B2Jun 13, 2023
Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process
SHINETSU CHEMICAL CO0 citations62
US11500292B2Nov 15, 2022
Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film
SHINETSU CHEMICAL CO0 citations62
US12379661B2Aug 5, 2025
Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film
SHINETSU CHEMICAL CO0 citations61
US11886118B2Jan 30, 2024
Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film
SHINETSU CHEMICAL CO0 citations61
US11851530B2Dec 26, 2023
Material for forming organic film, patterning process, and polymer
SHINETSU CHEMICAL CO0 citations61
US11675268B2Jun 13, 2023
Composition for forming organic film, patterning process, and polymer
SHINETSU CHEMICAL CO0 citations61
US11022882B2Jun 1, 2021
Compound and composition for forming organic film
SHINETSU CHEMICAL CO1 citations61
US10604618B2Mar 31, 2020
Compound, method for manufacturing the compound, and composition for forming organic film
SHINETSU CHEMICAL CO1 citations61
US12588474B2Mar 24, 2026
Composition for forming protective film against alkaline aqueous hydrogen peroxide, substrate for producing semiconductor apparatus, method for forming protective film, and method for forming pattern
SHINETSU CHEMICAL CO0 citations51
US11692066B2Jul 4, 2023
Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film
SHINETSU CHEMICAL CO0 citations51
US11635691B2Apr 25, 2023
Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer
SHINETSU CHEMICAL CO0 citations51
US11181821B2Nov 23, 2021
Composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, patterning process, and polymer
SHINETSU CHEMICAL CO0 citations51
US10998197B2May 4, 2021
Polymer and composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process
SHINETSU CHEMICAL CO0 citations51
US11307497B2Apr 19, 2022
Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process
SHINETSU CHEMICAL CO0 citations50
US11709429B2Jul 25, 2023
Composition for forming organic film, patterning process, and polymer
SHINETSU CHEMICAL CO0 citations47