Inventor
WEN CHIH-WEI
TW39 patents
⚠️ This page may combine multiple inventors who share the name “WEN CHIH-WEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
26 patentsUS11614684B2Mar 28, 2023
Photomask inspection method and apparatus thereof
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations74
US12072621B2Aug 27, 2024
Photomask inspection method and apparatus thereof
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11340524B2May 24, 2022
Photomask, method of fabricating a photomask, and method of fabricating a semiconductor structure using a photomask
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US11239001B2Feb 1, 2022
Method for generating extreme ultraviolet radiation and an extreme ultraviolet (EUV) radiation source
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11809076B2Nov 7, 2023
Cleaning method, method for forming semiconductor structure and system thereof
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11088003B2Aug 10, 2021
Apparatus for fabricating a semiconductor device and method for fabricating semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations70
US12422744B2Sep 23, 2025
Photomask inspection method and apparatus thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12532400B2Jan 20, 2026
EUV source with rotation crucible and laser and tin (SN) auto-filling method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12487531B2Dec 2, 2025
Extreme ultraviolet (EUV) radiation source apparatus, EUV lithography system, and method for generating extreme ultraviolet radiation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12405527B2Sep 2, 2025
Photomask, method of fabricating a photomask, and method of fabricating a semiconductor structure using a photomask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12242182B2Mar 4, 2025
Method for removing particles from pellicle and photomask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12189283B2Jan 7, 2025
Particle prevention method in reticle pod
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12153341B2Nov 26, 2024
Cleaning method, method for forming semiconductor structure and system thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11822231B2Nov 21, 2023
Method for removing particles from pellicle and photomask
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US11703752B2Jul 18, 2023
Method of accelerated hazing of mask assembly
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11347143B2May 31, 2022
Cleaning method, method for forming semiconductor structure and system thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11294275B2Apr 5, 2022
Apparatus for mounting a pellicle to a photomask and method for mounting a pellicle to a photomask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10983430B2Apr 20, 2021
Mask assembly and haze acceleration method
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US10775694B1Sep 15, 2020
Apparatus for mounting a pellicle to a photomask and method for mounting a pellicle to a photomask
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US12400890B2Aug 26, 2025
Apparatus for fabricating a semiconductor device and method for fabricating semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US12009238B2Jun 11, 2024
Apparatus for fabricating a semiconductor device and method for fabricating semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US12581754B2Mar 17, 2026
Method and apparatus to enhance semiconductor device manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations57
US11703754B2Jul 18, 2023
Particle prevention method in reticle pod
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US12282264B2Apr 22, 2025
Cleaning apparatus for cleaning surface of photomask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations47
US12085848B2Sep 10, 2024
Photomask cleaning tool
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations47
US12399439B2Aug 26, 2025
Pellicle, pellicle removal tool, and method of utilizing pellicle and pellicle removal tool
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations44
TAIWAN SEMICONDUCTOR MFG
4 patentsUS9312101B2Apr 12, 2016
Endpoint detection for photolithography mask repair
TAIWAN SEMICONDUCTOR MFG0 citations52
US9040212B2May 26, 2015
Endpoint detection for photolithography mask repair
TAIWAN SEMICONDUCTOR MFG0 citations52
US8999610B2Apr 7, 2015
Lithography mask repairing process
TAIWAN SEMICONDUCTOR MFG0 citations50
US7097948B2Aug 29, 2006
Method for repair of photomasks
TAIWAN SEMICONDUCTOR MFG0 citations46
EVERDISPLAY OPTRONICS SHANGHAI LTD
3 patentsUS10038170B2Jul 31, 2018
Method for cutting display panel
EVERDISPLAY OPTRONICS SHANGHAI LTD1 citations46
US9375897B2Jun 28, 2016
Display device and method for producing the same
EVERDISPLAY OPTRONICS SHANGHAI LTD0 citations43
US9327474B2May 3, 2016
Display device and methods for producing the same
EVERDISPLAY OPTRONICS SHANGHAI LTD0 citations43