Inventor
HIRUKAWA YOHICHI
JP2 patents
Patents
2 patentsUS4604180AAug 5, 1986
Target assembly capable of attaining a high step coverage ratio in a magnetron-type sputtering device
ANELVA CORP59 citations90
US4704199ANov 3, 1987
Method of forming an iron oxide film by reacting sputtering with control of a glow discharge by monitoring an emission spectrum of iron from the glow discharge
ANELVA CORP21 citations72