Inventor
HAMAURA KAORU
JP4 patents
Patents
4 patentsUS9855638B2Jan 2, 2018
Dressing apparatus, polishing apparatus having the dressing apparatus, and polishing method
EBARA CORP2 citations70
US10879086B2Dec 29, 2020
Substrate cleaning device, substrate cleaning apparatus, method for manufacturing cleaned substrate and substrate processing apparatus
EBARA CORP1 citations61
US10032655B2Jul 24, 2018
Substrate cleaning device, substrate cleaning apparatus, method for manufacturing cleaned substrate and substrate processing apparatus
EBARA CORP1 citations50
US9919403B2Mar 20, 2018
Polishing apparatus, polishing pad positioning method, and polishing pad
EBARA CORP1 citations49