Inventor
FUKADA TSUYOSHI
JP42 patents
⚠️ This page may combine multiple inventors who share the name “FUKADA TSUYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIPPON DENSO CO
22 patentsUS4721364AJan 26, 1988
Dazzle-free mirror with photocell in a non-dazzle-free portion
NIPPON DENSO CO367 citations99
US4676601AJun 30, 1987
Drive apparatus for a liquid crystal dazzle-free mirror arrangement
NIPPON DENSO CO285 citations99
US4671615AJun 9, 1987
Control apparatus for a dazzle-free reflection mirror of a vehicle
NIPPON DENSO CO361 citations99
US4669825AJun 2, 1987
Control apparatus with delay circuit for antiglare mirror
NIPPON DENSO CO258 citations99
US4669826AJun 2, 1987
Apparatus for detecting the direction of light for dazzle-free mirrors
NIPPON DENSO CO202 citations99
US4632509ADec 30, 1986
Glare-shielding type reflector
NIPPON DENSO CO260 citations99
US4623222ANov 18, 1986
Liquid crystal type dazzle-free transmissive-reflective mirror
NIPPON DENSO CO547 citations99
US4669827AJun 2, 1987
Detection of manipulation of position apparatus for dazzle-free mirror
NIPPON DENSO CO141 citations98
US4655549AApr 7, 1987
Automatic antidazzle semitransparent mirror
NIPPON DENSO CO144 citations98
US5289721AMar 1, 1994
Semiconductor pressure sensor
NIPPON DENSO CO63 citations96
US5622901AApr 22, 1997
Method of forming a semiconductor strain sensor
NIPPON DENSO CO28 citations93
US4687956AAug 18, 1987
Liquid crystal element driving apparatus
NIPPON DENSO CO52 citations93
US5949118ASep 7, 1999
Etching method for silicon substrates and semiconductor sensor
NIPPON DENSO CO30 citations92
US5654244AAug 5, 1997
Process for producing semiconductor strain-sensitive sensor
NIPPON DENSO CO34 citations92
US5643803AJul 1, 1997
Production method of a semiconductor dynamic sensor
NIPPON DENSO CO30 citations92
US5549785AAug 27, 1996
Method of producing a semiconductor dynamic sensor
NIPPON DENSO CO20 citations92
US5525549AJun 11, 1996
Method for producing an acceleration sensor
NIPPON DENSO CO42 citations92
US6077721AJun 20, 2000
Method of producing an anodic bonded semiconductor sensor element
NIPPON DENSO CO22 citations91
US5736061AApr 7, 1998
Semiconductor element mount and producing method therefor
NIPPON DENSO CO23 citations91
US5408112AApr 18, 1995
Semiconductor strain sensor having improved resistance to bonding strain effects
NIPPON DENSO CO36 citations91
US5575887ANov 19, 1996
Plasma etching method and device manufacturing method thereby
NIPPON DENSO CO6 citations62
US5677248AOct 14, 1997
Method of etching semiconductor wafers
NIPPON DENSO CO6 citations60
DENSO CORP
19 patentsUS6240782B1Jun 5, 2001
Semiconductor physical quantity sensor and production method thereof
DENSO CORP119 citations98
US6151966ANov 28, 2000
Semiconductor dynamical quantity sensor device having electrodes in Rahmen structure
DENSO CORP111 citations98
US6429506B1Aug 6, 2002
Semiconductor device produced by dicing
DENSO CORP82 citations97
US6308567B1Oct 30, 2001
Angular velocity sensor
DENSO CORP109 citations97
US6287885B1Sep 11, 2001
Method for manufacturing semiconductor dynamic quantity sensor
DENSO CORP84 citations97
US6423563B2Jul 23, 2002
Method for manufacturing semiconductor dynamic quantity sensor
DENSO CORP77 citations96
US7214625B2May 8, 2007
Method for manufacturing movable portion of semiconductor device
DENSO CORP22 citations92
US6444543B2Sep 3, 2002
Semiconductor sensor device and method of manufacturing the same
DENSO CORP23 citations92
US6284670B1Sep 4, 2001
Method of etching silicon wafer and silicon wafer
DENSO CORP39 citations92
US8028584B2Oct 4, 2011
Pressure sensor and method for manufacturing the same
DENSO CORP12 citations83
US6906394B2Jun 14, 2005
Method of manufacturing semiconductor device capable of sensing dynamic quantity
DENSO CORP6 citations74
US6787866B2Sep 7, 2004
Semiconductor device having a moveable member therein and a protective member disposed thereon
DENSO CORP10 citations74
US6753201B2Jun 22, 2004
Method of manufacturing semiconductor device capable of sensing dynamic quantity
DENSO CORP11 citations74
US6143584ANov 7, 2000
Method for fabrication of a semiconductor sensor
DENSO CORP12 citations74
US6194236B1Feb 27, 2001
Electrochemical etching method for silicon substrate having PN junction
DENSO CORP5 citations73
US6020618AFeb 1, 2000
Semiconductor device in which thin silicon portions are formed by electrochemical stop etching method
DENSO CORP13 citations71
US7298022B2Nov 20, 2007
Semiconductor sensor
DENSO CORP3 citations63
US5920106AJul 6, 1999
Semiconductor device and method for producing the same
DENSO CORP4 citations63
US8006553B2Aug 30, 2011
Semiconductor sensor having heater on insulation film and manufacturing method of the same
DENSO CORP1 citations44