Inventor
YOSHIDA YUKIMASA
JP26 patents
⚠️ This page may combine multiple inventors who share the name “YOSHIDA YUKIMASA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
10 patentsUS6642149B2Nov 4, 2003
Plasma processing method
TOKYO ELECTRON LTD92 citations97
US5660671AAug 26, 1997
Magnetron plasma processing apparatus and processing method
TOKYO ELECTRON LTD49 citations95
US5223113AJun 29, 1993
Apparatus for forming reduced pressure and for processing object
TOKYO ELECTRON LTD74 citations95
US5234527AAug 10, 1993
Liquid level detecting device and a processing apparatus
TOKYO ELECTRON LTD39 citations93
US5320704AJun 14, 1994
Plasma etching apparatus
TOKYO ELECTRON LTD23 citations92
US5178638AJan 12, 1993
Pressure-reduced chamber system having a filter means
TOKYO ELECTRON LTD31 citations91
US5376211ADec 27, 1994
Magnetron plasma processing apparatus and processing method
TOKYO ELECTRON LTD14 citations81
US5147497ASep 15, 1992
Plasma apparatus, and method and system for extracting electrical signal of member to which high-frequency wave is applied
TOKYO ELECTRON LTD17 citations72
US5211795AMay 18, 1993
Plasma etching apparatus and transporting device used in the same
TOKYO ELECTRON LTD2 citations63
US5888338AMar 30, 1999
Magnetron plasma processing apparatus and processing method
TOKYO ELECTRON LTD0 citations51
TOSHIBA KK
8 patentsUS5717294AFeb 10, 1998
Plasma process apparatus
TOSHIBA KK65 citations96
US6274507B1Aug 14, 2001
Plasma processing apparatus and method
TOSHIBA KK33 citations92
US5100508AMar 31, 1992
Method of forming fine patterns
TOSHIBA KK36 citations92
US6333246B1Dec 25, 2001
Semiconductor device manufacturing method using electrostatic chuck and semiconductor device manufacturing system
TOSHIBA KK18 citations82
US5286978AFeb 15, 1994
Method of removing electric charge accumulated on a semiconductor substrate in ion implantation
TOSHIBA KK11 citations74
US4566941AJan 28, 1986
Reactive ion etching method
TOSHIBA KK9 citations74
US5766494AJun 16, 1998
Etching method and apparatus
TOSHIBA KK2 citations63
US6368977B1Apr 9, 2002
Semiconductor device manufacturing method
TOSHIBA KK3 citations60
BROTHER IND LTD
5 patentsUS4905215AFeb 27, 1990
System for reading information from two storage layers of an optical disk in different manners
BROTHER IND LTD56 citations92
US7257338B2Aug 14, 2007
Image forming apparatus
BROTHER IND LTD7 citations74
US7885564B2Feb 8, 2011
Image forming device
BROTHER IND LTD2 citations63
US7613408B2Nov 3, 2009
Image forming apparatus for correcting image formation condition
BROTHER IND LTD2 citations60
US7937003B2May 3, 2011
Image forming apparatus and method of determining degradation of charging property of developer
BROTHER IND LTD0 citations42