Inventor
SU LIN-CHIN
TW5 patents
Patents
5 patentsUS7419882B2Sep 2, 2008
Alignment mark and alignment method for the fabrication of trench-capacitor dram devices
NANYA TECHNOLOGY CORP13 citations82
US6303491B1Oct 16, 2001
Method for fabricating self-aligned contact hole
NANYA TECHNOLOGY CORP5 citations62
US7723181B2May 25, 2010
Overlay alignment mark and alignment method for the fabrication of trench-capacitor dram devices
NANYA TECHNOLOGY CORP6 citations61
US6153482ANov 28, 2000
Method for fabricating LOCOS isolation having a planar surface which includes having the polish stop layer at a lower level than the LOCOS formation
NANYA TECHNOLOGY CORP6 citations58
US6225186B1May 1, 2001
Method for fabricating LOCOS isolation
NANYA TECHNOLOGY CORP2 citations55