Inventor
CROFFIE EBO H
US10 patents
⚠️ This page may combine multiple inventors who share the name “CROFFIE EBO H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LSI LOGIC CORP
4 patentsUS7189498B2Mar 13, 2007
Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process
LSI LOGIC CORP11 citations82
US7325222B2Jan 29, 2008
Method and apparatus for verifying the post-optical proximity corrected mask wafer image sensitivity to reticle manufacturing errors
LSI LOGIC CORP7 citations67
US7458060B2Nov 25, 2008
Yield-limiting design-rules-compliant pattern library generation and layout inspection
LSI LOGIC CORP5 citations53
US7001695B2Feb 21, 2006
Multiple alternating phase shift technology for amplifying resolution
LSI LOGIC CORP0 citations50
LSI CORP
4 patentsUS7372547B2May 13, 2008
Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography
LSI CORP8 citations71
US7264906B2Sep 4, 2007
OPC based illumination optimization with mask error constraints
LSI CORP4 citations61
US7494752B2Feb 24, 2009
Method and systems for utilizing simplified resist process models to perform optical and process corrections
LSI CORP2 citations60
US8377633B2Feb 19, 2013
Maskless vortex phase shift optical direct write lithography
LSI CORP0 citations50