Inventor
BOHR MARK T
US95 patents
⚠️ This page may combine multiple inventors who share the name “BOHR MARK T”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INTEL CORP
42 patentsUS6671947B2Jan 6, 2004
Method of making an interposer
INTEL CORP133 citations99
US6617681B1Sep 9, 2003
Interposer and method of making same
INTEL CORP130 citations99
US5708291AJan 13, 1998
Silicide agglomeration fuse device
INTEL CORP131 citations99
US5536675AJul 16, 1996
Isolation structure formation for semiconductor circuit fabrication
INTEL CORP154 citations99
US6653563B2Nov 25, 2003
Alternate bump metallurgy bars for power and ground routing
INTEL CORP124 citations98
US6624032B2Sep 23, 2003
Structure and process flow for fabrication of dual gate floating body integrated MOS transistors
INTEL CORP85 citations98
US6258700B1Jul 10, 2001
Silicide agglomeration fuse device
INTEL CORP85 citations98
US5969404AOct 19, 1999
Silicide agglomeration device
INTEL CORP91 citations98
US9466565B2Oct 11, 2016
Self-aligned contacts
INTEL CORP24 citations97
US7494858B2Feb 24, 2009
Transistor with improved tip profile and method of manufacture thereof
INTEL CORP104 citations97
US6337507B1Jan 8, 2002
Silicide agglomeration fuse device with notches to enhance programmability
INTEL CORP84 citations97
US6392271B1May 21, 2002
Structure and process flow for fabrication of dual gate floating body integrated MOS transistors
INTEL CORP64 citations96
US6143638ANov 7, 2000
Passivation structure and its method of fabrication
INTEL CORP69 citations96
US5976939ANov 2, 1999
Low damage doping technique for self-aligned source and drain regions
INTEL CORP54 citations96
US5734187AMar 31, 1998
Memory cell design with vertically stacked crossovers
INTEL CORP54 citations96
US4372034AFeb 8, 1983
Process for forming contact openings through oxide layers
INTEL CORP62 citations96
US11222863B2Jan 11, 2022
Techniques for die stacking and associated configurations
INTEL CORP21 citations94
US10886217B2Jan 5, 2021
Integrated circuit device with back-side interconnection to deep source/drain semiconductor
INTEL CORP20 citations94
US6020244AFeb 1, 2000
Channel dopant implantation with automatic compensation for variations in critical dimension
INTEL CORP75 citations94
US8013368B2Sep 6, 2011
Replacement gates to enhance transistor strain
INTEL CORP16 citations93
US6982225B2Jan 3, 2006
Interposer and method of making same
INTEL CORP34 citations93
US6875681B1Apr 5, 2005
Wafer passivation structure and method of fabrication
INTEL CORP16 citations93
US6124191ASep 26, 2000
Self-aligned contact process using low density/low k dielectric
INTEL CORP20 citations93
US9508821B2Nov 29, 2016
Self-aligned contacts
INTEL CORP13 citations92
US7943468B2May 17, 2011
Penetrating implant for forming a semiconductor device
INTEL CORP20 citations92
US7821044B2Oct 26, 2010
Transistor with improved tip profile and method of manufacture thereof
INTEL CORP32 citations92
US6888716B2May 3, 2005
On-die de-coupling capacitor using bumps or bars
INTEL CORP17 citations92
US6706584B2Mar 16, 2004
On-die de-coupling capacitor using bumps or bars and method of making same
INTEL CORP19 citations92
US5420051AMay 30, 1995
Pre-poly emitter implant
INTEL CORP21 citations92
US4282648AAug 11, 1981
CMOS process
INTEL CORP60 citations92
US4536947AAug 27, 1985
CMOS process for fabricating integrated circuits, particularly dynamic memory cells with storage capacitors
INTEL CORP43 citations89
US11522048B2Dec 6, 2022
Gate-all-around integrated circuit structures having source or drain structures with epitaxial nubs
INTEL CORP6 citations86
US5091332AFeb 25, 1992
Semiconductor field oxidation process
INTEL CORP50 citations85
US11887891B2Jan 30, 2024
Self-aligned contacts
INTEL CORP2 citations84
US11139241B2Oct 5, 2021
Integrated circuit device with crenellated metal trace layout
INTEL CORP6 citations84
US11024601B2Jun 1, 2021
Hyperchip
INTEL CORP4 citations84
US10930557B2Feb 23, 2021
Self-aligned contacts
INTEL CORP2 citations84
US10770587B2Sep 8, 2020
Semiconductor device having tipless epitaxial source/drain regions
INTEL CORP5 citations84
US10325840B2Jun 18, 2019
Metal on both sides with power distributed through the silicon
INTEL CORP6 citations84
US10141226B2Nov 27, 2018
Self-aligned contacts
INTEL CORP2 citations84
US9899255B2Feb 20, 2018
Via blocking layer
INTEL CORP8 citations84
US7208402B2Apr 24, 2007
Method and apparatus for improved power routing
INTEL CORP10 citations84
BOHR MARK T
6 patentsUS8450165B2May 28, 2013
Semiconductor device having tipless epitaxial source/drain regions
BOHR MARK T37 citations98
US8436404B2May 7, 2013
Self-aligned contacts
BOHR MARK T148 citations98
US9054178B2Jun 9, 2015
Self-aligned contacts
BOHR MARK T30 citations96
US9093513B2Jul 28, 2015
Self-aligned contacts
BOHR MARK T12 citations92
US8101485B2Jan 24, 2012
Replacement gates to enhance transistor strain
BOHR MARK T16 citations92
US9276112B2Mar 1, 2016
Semiconductor device having tipless epitaxial source/drain regions
BOHR MARK T7 citations84
MALLIK DEBENDRA
1 patentLEE KEVIN J
1 patentShowing the top 50 of 95 patents by PatentIndex Score.