Inventor
RIEKER JENNIFER M
US3 patents
Patents
3 patentsUS6951710B2Oct 4, 2005
Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof
AIR PROD & CHEM39 citations89
US7361631B2Apr 22, 2008
Compositions for the removal of organic and inorganic residues
AIR PROD & CHEM14 citations82
US7807613B2Oct 5, 2010
Aqueous buffered fluoride-containing etch residue removers and cleaners
AIR PROD & CHEM3 citations58