Inventor

THAKUR RANDHIR

US58 patents

⚠️ This page may combine multiple inventors who share the name “THAKUR RANDHIR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

THAKUR RANDHIR

MICRON TECHNOLOGY INC

Isolation structure and process therefor

Double layer electrode and barrier system on hemispherical grain silicon for use with high dielectric constant materials and methods for fabricating the same

Process for making an isolation structure

Method for forming a dielectric

Formation of conductive rugged silicon

Shallow junction formation using multiple implant sources

DRAM capacitor formulation using a double-sided electrode

Method of forming shallow doped junctions having a variable profile gradation of dopants

Diffusion-enhanced crystallization of amorphous materials to improve surface roughness

Shallow doped junctions with a variable profile gradation of dopants

High selectivity etching process for oxides

Diffusion-enhanced crystallization of amorphous materials to improve surface roughness

Method and apparatus for stabilizing high pressure oxidation of a semiconductor device

DRAM capacitor formulation using a double-sided electrode

DRAM capacitor formulation using a double-sided electrode

Method and apparatus for stabilizing high pressure oxidation of a semiconductor device

Formation of conductive rugged silicon

Method for stabilizing high pressure oxidation of a semiconductor device

Diffusion-enhanced crystallization of amorphous materials to improve surface roughness

Shallow doped junctions with a variable profile gradation of dopants

Double layer electrode and barrier system on hemispherical grain silicon for use with high dielectric constant materials and methods for fabricating the same

Diffusion-enhanced crystallization of amorphous materials to improve surface roughness

Formation of conductive rugged silicon

Double layer electrode and barrier system on hemispherical grain silicon for use with high dielectric constant materials and methods for fabricating the same

High selectivity etching process for oxides

High selectivity etching process for oxides

Method for forming a dielectric

APPLIED MATERIALS INC

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Integrated bit-line airgap formation and gate stack post clean

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Integrated oxide and nitride recess for better channel contact in 3D architectures

Metal air gap

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Integrated bit-line airgap formation and gate stack post clean

Integrated oxide recess and floating gate fin trimming

Method and apparatus to improve thickness uniformity of surfaces for integrated device manufacturing

Optimal spike anneal ambient

Low temperature epitaxial growth of silicon-containing films using close proximity UV radiation

Processing multilayer semiconductors with multiple heat sources

Semiconductor device processing tools and methods for patterning substrates

Methods for forming low resistivity interconnects

RAMAMURTHY SUNDAR

Processing multilayer semiconductors with multiple heat sources

SANDISK 3D LLC

Method of making a nonvolatile memory device including forming a pillar shaped semiconductor device and a shadow mask

OLSEN CHRISTOPHER

Stabilization of high-k dielectric materials

SINGH KAUSHAL K

Low temperature epitaxial growth of silicon-containing films using UV radiation