Inventor
TOBE RYOKI
JP6 patents
Patents
6 patentsUS5891349AApr 6, 1999
Plasma enhanced CVD apparatus and process, and dry etching apparatus and process
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US5855685AJan 5, 1999
Plasma enhanced CVD apparatus, plasma enhanced processing apparatus and plasma enhanced CVD method
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US6080446AJun 27, 2000
Method of depositing titanium nitride thin film and CVD deposition apparatus
ANELVA CORP106 citations96
US5721021AFeb 24, 1998
Method of depositing titanium-containing conductive thin film
ANELVA CORP62 citations95
US6471781B1Oct 29, 2002
Method of depositing titanium nitride thin film and CVD deposition apparatus
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US6468604B1Oct 22, 2002
Method for manufacturing a titanium nitride thin film
ANELVA CORP10 citations73