P

Inventor

HOLLAND JOHN

US85 patents
⚠️ This page may combine multiple inventors who share the name “HOLLAND JOHN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

21 patents
US6414648B1Jul 2, 2002

Plasma reactor having a symmetric parallel conductor coil antenna

APPLIED MATERIALS INC142 citations99
US6685798B1Feb 3, 2004

Plasma reactor having a symmetrical parallel conductor coil antenna

APPLIED MATERIALS INC75 citations98
US6635578B1Oct 21, 2003

Method of operating a dual chamber reactor with neutral density decoupled from ion density

APPLIED MATERIALS INC615 citations98
US6617794B2Sep 9, 2003

Method for controlling etch uniformity

APPLIED MATERIALS INC87 citations98
US6818562B2Nov 16, 2004

Method and apparatus for tuning an RF matching network in a plasma enhanced semiconductor wafer processing system

APPLIED MATERIALS INC94 citations97
US6507155B1Jan 14, 2003

Inductively coupled plasma source with controllable power deposition

APPLIED MATERIALS INC106 citations97
US6447636B1Sep 10, 2002

Plasma reactor with dynamic RF inductive and capacitive coupling control

APPLIED MATERIALS INC215 citations97
US6706138B2Mar 16, 2004

Adjustable dual frequency voltage dividing plasma reactor

APPLIED MATERIALS INC56 citations96
US6694915B1Feb 24, 2004

Plasma reactor having a symmetrical parallel conductor coil antenna

APPLIED MATERIALS INC60 citations96
US6462481B1Oct 8, 2002

Plasma reactor having a symmetric parallel conductor coil antenna

APPLIED MATERIALS INC68 citations96
US6831021B2Dec 14, 2004

Plasma method and apparatus for processing a substrate

APPLIED MATERIALS INC54 citations93
US6660659B1Dec 9, 2003

Plasma method and apparatus for processing a substrate

APPLIED MATERIALS INC44 citations93
US6409933B1Jun 25, 2002

Plasma reactor having a symmetric parallel conductor coil antenna

APPLIED MATERIALS INC45 citations93
US6660127B2Dec 9, 2003

Apparatus for plasma etching at a constant etch rate

APPLIED MATERIALS INC26 citations92
US6598615B1Jul 29, 2003

Compact independent pressure control and vacuum isolation for a turbomolecular pumped plasma reaction chamber

APPLIED MATERIALS INC20 citations92
US6399507B1Jun 4, 2002

Stable plasma process for etching of films

APPLIED MATERIALS INC34 citations92
US7436645B2Oct 14, 2008

Method and apparatus for controlling temperature of a substrate

APPLIED MATERIALS INC37 citations91
US10257887B2Apr 9, 2019

Substrate support assembly

APPLIED MATERIALS INC6 citations84
US9883549B2Jan 30, 2018

Substrate support assembly having rapid temperature control

APPLIED MATERIALS INC6 citations84
US7879185B2Feb 1, 2011

Dual frequency RF match

APPLIED MATERIALS INC7 citations84
US7544251B2Jun 9, 2009

Method and apparatus for controlling temperature of a substrate

APPLIED MATERIALS INC13 citations84

LAM RES CORP

6 patents

DISNEY ENTPR INC

4 patents

INTEL CORP

4 patents

MATYUSHKIN ALEXANDER

3 patents

(unassigned)

3 patents

PERFECT PUSHUP LLC

2 patents

MKS INSTR INC

2 patents

HOLLAND JOHN

1 patent

TECHNOLOGY INVESTMENTS LTD

1 patent

ACCUSPHYG LLC

1 patent

ALLEGIANCE CORP

1 patent

MCCHESNEY JON

1 patent

Showing the top 50 of 85 patents by PatentIndex Score.