Inventor
HOLLAND JOHN
US85 patents
⚠️ This page may combine multiple inventors who share the name “HOLLAND JOHN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
21 patentsUS6414648B1Jul 2, 2002
Plasma reactor having a symmetric parallel conductor coil antenna
APPLIED MATERIALS INC142 citations99
US6685798B1Feb 3, 2004
Plasma reactor having a symmetrical parallel conductor coil antenna
APPLIED MATERIALS INC75 citations98
US6635578B1Oct 21, 2003
Method of operating a dual chamber reactor with neutral density decoupled from ion density
APPLIED MATERIALS INC615 citations98
US6617794B2Sep 9, 2003
Method for controlling etch uniformity
APPLIED MATERIALS INC87 citations98
US6818562B2Nov 16, 2004
Method and apparatus for tuning an RF matching network in a plasma enhanced semiconductor wafer processing system
APPLIED MATERIALS INC94 citations97
US6507155B1Jan 14, 2003
Inductively coupled plasma source with controllable power deposition
APPLIED MATERIALS INC106 citations97
US6447636B1Sep 10, 2002
Plasma reactor with dynamic RF inductive and capacitive coupling control
APPLIED MATERIALS INC215 citations97
US6706138B2Mar 16, 2004
Adjustable dual frequency voltage dividing plasma reactor
APPLIED MATERIALS INC56 citations96
US6694915B1Feb 24, 2004
Plasma reactor having a symmetrical parallel conductor coil antenna
APPLIED MATERIALS INC60 citations96
US6462481B1Oct 8, 2002
Plasma reactor having a symmetric parallel conductor coil antenna
APPLIED MATERIALS INC68 citations96
US6831021B2Dec 14, 2004
Plasma method and apparatus for processing a substrate
APPLIED MATERIALS INC54 citations93
US6660659B1Dec 9, 2003
Plasma method and apparatus for processing a substrate
APPLIED MATERIALS INC44 citations93
US6409933B1Jun 25, 2002
Plasma reactor having a symmetric parallel conductor coil antenna
APPLIED MATERIALS INC45 citations93
US6660127B2Dec 9, 2003
Apparatus for plasma etching at a constant etch rate
APPLIED MATERIALS INC26 citations92
US6598615B1Jul 29, 2003
Compact independent pressure control and vacuum isolation for a turbomolecular pumped plasma reaction chamber
APPLIED MATERIALS INC20 citations92
US6399507B1Jun 4, 2002
Stable plasma process for etching of films
APPLIED MATERIALS INC34 citations92
US7436645B2Oct 14, 2008
Method and apparatus for controlling temperature of a substrate
APPLIED MATERIALS INC37 citations91
US10257887B2Apr 9, 2019
Substrate support assembly
APPLIED MATERIALS INC6 citations84
US9883549B2Jan 30, 2018
Substrate support assembly having rapid temperature control
APPLIED MATERIALS INC6 citations84
US7879185B2Feb 1, 2011
Dual frequency RF match
APPLIED MATERIALS INC7 citations84
US7544251B2Jun 9, 2009
Method and apparatus for controlling temperature of a substrate
APPLIED MATERIALS INC13 citations84
LAM RES CORP
6 patentsUS5589737ADec 31, 1996
Plasma processor for large workpieces
LAM RES CORP75 citations95
US10504744B1Dec 10, 2019
Three or more states for achieving high aspect ratio dielectric etch
LAM RES CORP25 citations93
US9673058B1Jun 6, 2017
Method for etching features in dielectric layers
LAM RES CORP24 citations92
US6344151B1Feb 5, 2002
Gas purge protection of sensors and windows in a gas phase processing reactor
LAM RES CORP30 citations92
US6071375AJun 6, 2000
Gas purge protection of sensors and windows in a gas phase processing reactor
LAM RES CORP26 citations92
US11335539B2May 17, 2022
Systems and methods for optimizing power delivery to an electrode of a plasma chamber
LAM RES CORP6 citations85
DISNEY ENTPR INC
4 patentsUSD559723SJan 15, 2008
Watch fastener
DISNEY ENTPR INC73 citations97
US7363687B2Apr 29, 2008
Snapping and hinging arrangements, watches and associated methods
DISNEY ENTPR INC43 citations95
USD517441SMar 21, 2006
Watch fastener
DISNEY ENTPR INC71 citations95
US7708456B2May 4, 2010
Snapping and hinging arrangements, watches and associated methods
DISNEY ENTPR INC14 citations92
INTEL CORP
4 patentsUS6556672B1Apr 29, 2003
Fault tolerant voice processing system
INTEL CORP22 citations92
US6990183B2Jan 24, 2006
Multiple platform voice processing system with optimized resource allocation
INTEL CORP23 citations91
US6418201B1Jul 9, 2002
Multiple platform voice processing system with optimized resource allocation
INTEL CORP30 citations91
US6304645B1Oct 16, 2001
Call processing system with resources on multiple platforms
INTEL CORP19 citations83
MATYUSHKIN ALEXANDER
3 patentsUS8226769B2Jul 24, 2012
Substrate support with electrostatic chuck having dual temperature zones
MATYUSHKIN ALEXANDER80 citations96
US9275887B2Mar 1, 2016
Substrate processing with rapid temperature gradient control
MATYUSHKIN ALEXANDER20 citations92
US8663391B2Mar 4, 2014
Electrostatic chuck having a plurality of heater coils
MATYUSHKIN ALEXANDER35 citations92
(unassigned)
3 patentsUS6893533B2May 17, 2005
Plasma reactor having a symmetric parallel conductor coil antenna
64 citations96
US6829056B1Dec 7, 2004
Monitoring dimensions of features at different locations in the processing of substrates
107 citations96
US6727655B2Apr 27, 2004
Method and apparatus to monitor electrical states at a workpiece in a semiconductor processing chamber
17 citations84
PERFECT PUSHUP LLC
2 patentsMKS INSTR INC
2 patentsHOLLAND JOHN
1 patentTECHNOLOGY INVESTMENTS LTD
1 patentACCUSPHYG LLC
1 patentALLEGIANCE CORP
1 patentMCCHESNEY JON
1 patentShowing the top 50 of 85 patents by PatentIndex Score.