Inventor
YUAN JACK H
US51 patents
⚠️ This page may combine multiple inventors who share the name “YUAN JACK H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SANDISK CORP
47 patentsUS6925007B2Aug 2, 2005
Multi-state non-volatile integrated circuit memory systems that employ dielectric storage elements
SANDISK CORP241 citations99
US6420231B1Jul 16, 2002
Processing techniques for making a dual floating gate EEPROM cell array
SANDISK CORP138 citations99
US6266278B1Jul 24, 2001
Dual floating gate EEPROM cell array with steering gates shared adjacent cells
SANDISK CORP173 citations99
US6151248ANov 21, 2000
Dual floating gate EEPROM cell array with steering gates shared by adjacent cells
SANDISK CORP462 citations99
US6103573AAug 15, 2000
Processing techniques for making a dual floating gate EEPROM cell array
SANDISK CORP390 citations99
US5712179AJan 27, 1998
Method of making triple polysilicon flash EEPROM arrays having a separate erase gate for each row of floating gates
SANDISK CORP137 citations99
US5677872AOct 14, 1997
Low voltage erase of a flash EEPROM system having a common erase electrode for two individual erasable sectors
SANDISK CORP129 citations99
US5661053AAug 26, 1997
Method of making dense flash EEPROM cell array and peripheral supporting circuits formed in deposited field oxide with the use of spacers
SANDISK CORP859 citations99
US5595924AJan 21, 1997
Technique of forming over an irregular surface a polysilicon layer with a smooth surface
SANDISK CORP484 citations99
US5534456AJul 9, 1996
Method of making dense flash EEPROM cell array and peripheral supporting circuits formed in deposited field oxide with sidewall spacers
SANDISK CORP171 citations99
US7342279B2Mar 11, 2008
Multi-state non-volatile integrated circuit memory systems that employ dielectric storage elements
SANDISK CORP65 citations98
US6936887B2Aug 30, 2005
Non-volatile memory cells utilizing substrate trenches
SANDISK CORP101 citations98
US6762092B2Jul 13, 2004
Scalable self-aligned dual floating gate memory cell array and methods of forming the array
SANDISK CORP78 citations98
US6532172B2Mar 11, 2003
Steering gate and bit line segmentation in non-volatile memories
SANDISK CORP101 citations98
US6512263B1Jan 28, 2003
Non-volatile memory cell array having discontinuous source and drain diffusions contacted by continuous bit line conductors and methods of forming
SANDISK CORP329 citations98
US6344993B1Feb 5, 2002
Dual floating gate EEPROM cell array with steering gates shared by adjacent cells
SANDISK CORP96 citations98
US6281075B1Aug 28, 2001
Method of controlling of floating gate oxide growth by use of an oxygen barrier
SANDISK CORP116 citations98
US5756385AMay 26, 1998
Dense flash EEPROM cell array and peripheral supporting circuits formed in deposited field oxide with the use of spacers
SANDISK CORP107 citations98
US5579259ANov 26, 1996
Low voltage erase of a flash EEPROM system having a common erase electrode for two individually erasable sectors
SANDISK CORP103 citations98
US7211866B2May 1, 2007
Scalable self-aligned dual floating gate memory cell array and methods of forming the array
SANDISK CORP45 citations96
US6908817B2Jun 21, 2005
Flash memory array with increased coupling between floating and control gates
SANDISK CORP50 citations96
US6028336AFeb 22, 2000
Triple polysilicon flash EEPROM arrays having a separate erase gate for each row of floating gates, and methods of manufacturing such arrays
SANDISK CORP67 citations96
US5965913AOct 12, 1999
Dense vertical programmable read only memory cell structures and processes for making them
SANDISK CORP74 citations96
US5847425ADec 8, 1998
Dense vertical programmable read only memory cell structures and processes for making them
SANDISK CORP61 citations96
US5747359AMay 5, 1998
Method of patterning polysilicon layers on substrate
SANDISK CORP75 citations96
US5654217AAug 5, 1997
Dense flash EEPROM cell array and peripheral supporting circuits formed in deposited field oxide with the use of spacers
SANDISK CORP63 citations96
US5512505AApr 30, 1996
Method of making dense vertical programmable read only memory cell structure
SANDISK CORP76 citations96
US7579247B2Aug 25, 2009
Multi-state non-volatile integrated circuit memory systems that employ dielectric storage elements
SANDISK CORP11 citations93
US7341918B2Mar 11, 2008
Multi-state non-volatile integrated circuit memory systems that employ dielectric storage elements
SANDISK CORP24 citations93
US6897522B2May 24, 2005
Multi-state non-volatile integrated circuit memory systems that employ dielectric storage elements
SANDISK CORP37 citations93
US6894343B2May 17, 2005
Floating gate memory cells utilizing substrate trenches to scale down their size
SANDISK CORP37 citations93
US6953964B2Oct 11, 2005
Non-volatile memory cell array having discontinuous source and drain diffusions contacted by continuous bit line conductors and methods of forming
SANDISK CORP19 citations92
US6953970B2Oct 11, 2005
Scalable self-aligned dual floating gate memory cell array and methods of forming the array
SANDISK CORP23 citations92
US6723604B2Apr 20, 2004
Non-volatile memory cell array having discontinuous source and drain diffusions contacted by continuous bit line conductors and methods of forming
SANDISK CORP24 citations92
US7834392B2Nov 16, 2010
Multi-state non-volatile integrated circuit memory systems that employ dielectric storage elements
SANDISK CORP8 citations84
US7615820B2Nov 10, 2009
Self-aligned trenches with grown dielectric for high coupling ratio in semiconductor devices
SANDISK CORP8 citations84
US7517756B2Apr 14, 2009
Flash memory array with increased coupling between floating and control gates
SANDISK CORP11 citations84
US7479677B2Jan 20, 2009
Multi-state non-volatile integrated circuit memory systems that employ dielectric storage elements
SANDISK CORP9 citations84
US7416956B2Aug 26, 2008
Self-aligned trench filling for narrow gap isolation regions
SANDISK CORP15 citations84
US7402886B2Jul 22, 2008
Memory with self-aligned trenches for narrow gap isolation regions
SANDISK CORP12 citations84
US7381615B2Jun 3, 2008
Methods for self-aligned trench filling with grown dielectric for high coupling ratio in semiconductor devices
SANDISK CORP7 citations74
US7170131B2Jan 30, 2007
Flash memory array with increased coupling between floating and control gates
SANDISK CORP9 citations74
US7087951B2Aug 8, 2006
Non-volatile memory cells utilizing substrate trenches
SANDISK CORP6 citations74
US7288455B2Oct 30, 2007
Method of forming non-volatile memory cell array having discontinuous source and drain diffusions contacted by continuous bit line conductors
SANDISK CORP6 citations73
US7858472B2Dec 28, 2010
Scalable self-aligned dual floating gate memory cell array and methods of forming the array
SANDISK CORP2 citations63
US7491999B2Feb 17, 2009
Non-volatile memory cells utilizing substrate trenches
SANDISK CORP2 citations63
US6458658B1Oct 1, 2002
Control of floating gate oxide growth by use of an oxygen barrier
SANDISK CORP5 citations63
SUNDISK CORP
3 patentsUS5380672AJan 10, 1995
Dense vertical programmable read only memory cell structures and processes for making them
SUNDISK CORP139 citations99
US5343063AAug 30, 1994
Dense vertical programmable read only memory cell structure and processes for making them
SUNDISK CORP903 citations99
US5070032ADec 3, 1991
Method of making dense flash eeprom semiconductor memory structures
SUNDISK CORP904 citations99
Showing the top 50 of 51 patents by PatentIndex Score.