Inventor

BRISTOL ROBERT L

US48 patents

⚠️ This page may combine multiple inventors who share the name “BRISTOL ROBERT L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BRISTOL ROBERT L

INTEL CORP

Metal-insulator-metal capacitor formation techniques

Subtractive self-aligned via and plug patterning for back end of line (BEOL) interconnects

Advanced lithography and self-assembled devices

Image tone-reversal with a dielectric using bottom-up cross-linking for back end of line (BEOL) interconnects

Precursor and process design for photo-assisted metal atomic layer deposition (ALD) and chemical vapor deposition (CVD)

Forming layers of materials over small regions by selective chemical reaction including limiting enchroachment of the layers over adjacent regions

Pre-patterned hard mask for ultrafast lithographic imaging

Advanced lithography and self-assembled devices

Advanced lithography and self-assembled devices

Quantum dot array devices

Advanced lithography and self-assembled devices

Ligand-capped main group nanoparticles as high absorption extreme ultraviolet lithography resists

Magneto-electric spin orbit (MESO) structures having functional oxide vias

Quantum dot array devices

Self-aligned via

Structure and method to self align via to top and bottom of tight pitch metal interconnect layers

Self-aligned via and plug patterning with photobuckets for back end of line (BEOL) interconnects

Lined photobucket structure for back end of line (BEOL) interconnect formation

Method for creating alternate hardmask cap interconnect structure with increased overlay margin

Metal-insulator-metal capacitor formation techniques

Two-stage bake photoresist with releasable quencher

Non-lithographically patterned directed self assembly alignment promotion layers

Differential hardmasks for modulation of electrobucket sensitivity

Ligand-capped main group nanoparticles as high absorption extreme ultraviolet lithography resists

Damascene plug and tab patterning with photobuckets

Differential hardmasks for modulation of electrobucket sensitivity

Techniques for forming vias and other interconnects for integrated circuit structures

Photobucket floor colors with selective grafting

Subtractive plug and tab patterning with photobuckets for back end of line (BEOL) spacer-based interconnects

Damascene plug and tab patterning with photobuckets for back end of line (BEOL) spacer-based interconnects

Lined photobucket structure for back end of line (BEOL) interconnect formation

Two-stage bake photoresist with releasable quencher

Methods to manufacture contaminant-gettering materials in the surface of EUV optics

Spacer-based patterning for tight-pitch and low-variability random access memory (RAM) bit cells and the resulting structures

Directed self-assembly structures and techniques

Surface-aligned lithographic patterning approaches for back end of line (BEOL) interconnect fabrication

Structures and methods for improved lithographic processing

Non-lithographically patterned directed self assembly alignment promotion layers

Pre-patterned hard mask for ultrafast lithographic imaging

Materials and deposition schemes using photoactive materials for interface chemical control and patterning of predefined structures

Integrating MEMS structures with interconnects and vias

Methods to manufacture contaminant-gettering materials in the surface of EUV optics

BRISTOL ROBERT L

Self-aligned via patterning with multi-colored photobuckets for back end of line (BEOL) interconnects

Self-aligned via patterning with multi-colored photobuckets for back end of line (BEOL) interconnects

Self-aligned via and plug patterning with photobuckets for back end of line (BEOL) interconnects

MYERS ALAN M

Diagonal hardmasks for improved overlay in fabricating back end of line (BEOL) interconnects

Diagonal hardmasks for improved overlay in fabricating back end of line (BEOL) interconnects

TAHOE RES LTD

Subtractive plug and tab patterning with photobuckets for back end of line (BEOL) spacer-based interconnects