Inventor

ENDO MASAYUKI

JP172 patents

⚠️ This page may combine multiple inventors who share the name “ENDO MASAYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ENDO MASAYUKI

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

Electroless plating bath used for forming a wiring of a semiconductor device, and method of forming a wiring of a semiconductor device

Semiconductor device having dot elements as floating gate

Method for forming dot element

Electroless plating bath used for forming a wiring of a semiconductor device, and method of forming a wiring of a semiconductor device

Thin layer forming method wherein hydrophobic molecular layers preventing a BPSG layer from absorbing moisture

Water-soluble photopolymer and method of forming pattern by use of the same

Semiconductor manufacturing apparatus and pattern formation method

Method of forming a resist pattern utilizing correlation between latent image height, resist pattern linewidth and surface modification layer width

Method of forming micropatterns by having a resist film absorb water

Method of producing a stencil mask

Integrator for an exposure apparatus or the like

Exposure apparatus

Pattern forming material and pattern forming method

Pattern forming material and pattern forming method

Method of forming a resist pattern utilizing correlation between latent image height, resist pattern linewidth and exposure parameter

Negative working resist composition

Method of preventing the corrosion of metallic wirings

Pattern formation method

Pattern formation method

Patterning material and patterning method

JAPAN SYNTHETIC RUBBER CO LTD

Reflection preventing film and process for forming resist pattern using the same

Process for the preparation of 1,2-polybutadiene

Epoxy group-containing resin compositions

Radiation sensitive quinone diazide and resin composition for microlens

Epoxy group-containing copolymer and radiation sensitive resin compositions thereof

WAKO PURE CHEM IND LTD

Pattern formation method

Resist material

Resist composition containing specific cross-linking agent

Process for forming a pattern on a semiconductor substrate using a deep ultraviolet absorbent composition

Deep ultraviolet absorbent composition

SHINETSU CHEMICAL CO

Resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

BANDAI CO

Toy robot

Toy robot

Toy robot

Monster-shaped toy

CENTRAL GLASS CO LTD

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Esters, polymers, resist compositions and patterning process

TERUMO CORP

Syringe

Syringe

Syringe

JSR CORP

Radiation sensitive resin composition

Radiation sensitive resin composition and use of the same in an interlaminar insulating film

SONY CORP

Non-aqueous electrolyte secondary battery

PANASONIC CORP

Polymer, resist composition and patterning process