Inventor

SASAGO MASARU

JP153 patents

⚠️ This page may combine multiple inventors who share the name “SASAGO MASARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SASAGO MASARU

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

Water-soluble photopolymer and method of forming pattern by use of the same

Semiconductor manufacturing apparatus and pattern formation method

Method of forming micropatterns by having a resist film absorb water

Method of producing a stencil mask

Integrator for an exposure apparatus or the like

Exposure apparatus

Method for forming a fine pattern

Method for forming pattern

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

Composition for forming porous film, porous film and method for forming the same, interlevel insulator film

Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device

Pattern formation method

Pattern formation method

Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor device

Pattern formation material and pattern formation method

Exposure apparatus

Pattern formation method

Pattern formation method and exposure system

Pattern formation method

Pattern formation method

Pattern formation method

Method of forming micropatterns

Process for forming a positive pattern through deep ultraviolet exposure, heat treatment and development with TMAH solution containing an alcohol to improve adhesion

Pattern forming method using contrast enhanced material

Exposure apparatus

Polymer compound, resist material and pattern formation method

SHINETSU CHEMICAL CO

Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device

Resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Process for preparing a dispersion liquid of zeolite fine particles

Semiconductor device comprising porous film

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device

CENTRAL GLASS CO LTD

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Polymers, resist compositions and patterning process

Esters, polymers, resist compositions and patterning process

PANASONIC CORP

Dry etching method, fine structure formation method, mold and mold fabrication method

Polymer, resist composition and patterning process

Photo mask and method for forming pattern using the same

Exposure system and pattern formation method

PANASONIC IP MAN CO LTD

Fused hetero 5-membered ring molecule, p-type semiconductor film and electronic device

Fused thiophene molecule and p-type semiconductor film and electronic device

ENDOU MASAYUKI

Pattern forming method

PD SERVICE CORP

Exposure mask, method for manufacturing the mask, and exposure method