Inventor
SANDSTROEM TORBJOERN
SE40 patents
⚠️ This page may combine multiple inventors who share the name “SANDSTROEM TORBJOERN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRONIC LASER SYSTEMS AB
27 patentsUS6618185B2Sep 9, 2003
Defective pixel compensation method
MICRONIC LASER SYSTEMS AB141 citations99
US7184192B2Feb 27, 2007
Pattern generator diffractive mirror methods and systems
MICRONIC LASER SYSTEMS AB32 citations96
US6813062B2Nov 2, 2004
Defective pixel compensation method
MICRONIC LASER SYSTEMS AB42 citations96
US6605816B2Aug 12, 2003
Reticle and direct lithography writing strategy
MICRONIC LASER SYSTEMS AB37 citations96
US6891655B2May 10, 2005
High energy, low energy density, radiation-resistant optics used with micro-electromechanical devices
MICRONIC LASER SYSTEMS AB175 citations95
US7302111B2Nov 27, 2007
Graphics engine for high precision lithography
MICRONIC LASER SYSTEMS AB52 citations94
US6624880B2Sep 23, 2003
Method and apparatus for microlithography
MICRONIC LASER SYSTEMS AB54 citations94
US7542129B2Jun 2, 2009
Patterning apparatuses and methods for the same
MICRONIC LASER SYSTEMS AB24 citations92
US7158280B2Jan 2, 2007
Methods and systems for improved boundary contrast
MICRONIC LASER SYSTEMS AB30 citations92
US7106490B2Sep 12, 2006
Methods and systems for improved boundary contrast
MICRONIC LASER SYSTEMS AB21 citations92
US6833854B1Dec 21, 2004
Method for high precision printing of patterns
MICRONIC LASER SYSTEMS AB46 citations92
US6645677B1Nov 11, 2003
Dual layer reticle blank and manufacturing process
MICRONIC LASER SYSTEMS AB21 citations92
US7328425B2Feb 5, 2008
Method and device for correcting SLM stamp image imperfections
MICRONIC LASER SYSTEMS AB27 citations91
US6965119B2Nov 15, 2005
Method and apparatus of calibrating multi-position SLM elements
MICRONIC LASER SYSTEMS AB30 citations91
US6700600B1Mar 2, 2004
Beam positioning in microlithography writing
MICRONIC LASER SYSTEMS AB22 citations89
US6819490B2Nov 16, 2004
Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece
MICRONIC LASER SYSTEMS AB43 citations87
US7842926B2Nov 30, 2010
Method and device for correcting SLM stamp image imperfections
MICRONIC LASER SYSTEMS AB11 citations82
US7646919B2Jan 12, 2010
Graphics engine for high precision lithography
MICRONIC LASER SYSTEMS AB9 citations82
US7588870B2Sep 15, 2009
Dual layer workpiece masking and manufacturing process
MICRONIC LASER SYSTEMS AB4 citations74
US7323291B2Jan 29, 2008
Dual layer workpiece masking and manufacturing process
MICRONIC LASER SYSTEMS AB8 citations74
US7153634B2Dec 26, 2006
Dual layer workpiece masking and manufacturing process
MICRONIC LASER SYSTEMS AB8 citations74
US6956692B2Oct 18, 2005
Method and apparatus for controlling exposure of a surface of a substrate
MICRONIC LASER SYSTEMS AB8 citations74
US6950194B2Sep 27, 2005
Alignment sensor
MICRONIC LASER SYSTEMS AB8 citations74
US7715641B2May 11, 2010
Graphics engine for high precision lithography
MICRONIC LASER SYSTEMS AB6 citations71
US7934172B2Apr 26, 2011
SLM lithography: printing to below K1=.30 without previous OPC processing
MICRONIC LASER SYSTEMS AB6 citations62
US7923182B2Apr 12, 2011
Multi-focus method of enhanced three-dimensional exposure of resist
MICRONIC LASER SYSTEMS AB2 citations61
US6903859B2Jun 7, 2005
Homogenizer
MICRONIC LASER SYSTEMS AB1 citations52
SANDSTROEM TORBJOERN
11 patentsUS8160351B2Apr 17, 2012
Method and apparatus for mura detection and metrology
SANDSTROEM TORBJOERN31 citations91
US8102410B2Jan 24, 2012
Writing apparatuses and methods
SANDSTROEM TORBJOERN8 citations84
US8537416B2Sep 17, 2013
Rotor optics imaging method and system with variable dose during sweep
SANDSTROEM TORBJOERN7 citations83
US8144307B2Mar 27, 2012
Image forming method and apparatus
SANDSTROEM TORBJOERN5 citations73
US8531755B2Sep 10, 2013
SLM device and method combining multiple mirrors for high-power delivery
SANDSTROEM TORBJOERN2 citations61
US8067134B2Nov 29, 2011
Method of iterative compensation for non-linear effects in three-dimensional exposure of resist
SANDSTROEM TORBJOERN1 citations61
US8442302B2May 14, 2013
Method and device using rotating printing arm to project or view image across a workpiece
SANDSTROEM TORBJOERN3 citations60
US8570613B2Oct 29, 2013
Lithographic printing system with placement corrections
SANDSTROEM TORBJOERN0 citations52
US8472089B2Jun 25, 2013
Rotor imaging system and method with variable-rate pixel clock
SANDSTROEM TORBJOERN0 citations52
US8456613B2Jun 4, 2013
Method and apparatus for quantification of illumination non-uniformity in the mask plane of a lithographic exposure system
SANDSTROEM TORBJOERN0 citations52
US8057971B2Nov 15, 2011
Method of compensation for bleaching of resist during three-dimensional exposure of resist
SANDSTROEM TORBJOERN0 citations51