P

Inventor

HORI MASAFUMI

JP24 patents
⚠️ This page may combine multiple inventors who share the name “HORI MASAFUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

JSR CORP

20 patents
US8815493B2Aug 26, 2014

Resist pattern-forming method, and radiation-sensitive resin composition

JSR CORP4 citations72
US11705331B2Jul 18, 2023

Method and composition for selectively modifying base material surface

JSR CORP0 citations62
US11370872B2Jun 28, 2022

Composition for pattern formation, and pattern-forming method

JSR CORP0 citations62
US11211246B2Dec 28, 2021

Method and composition for selectively modifying base material surface

JSR CORP0 citations62
US10950438B2Mar 16, 2021

Method and composition for selectively modifying base material surface

JSR CORP0 citations62
US9170488B2Oct 27, 2015

Resist pattern-forming method, and radiation-sensitive resin composition

JSR CORP2 citations61
US9046765B2Jun 2, 2015

Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film

JSR CORP2 citations61
US9513548B2Dec 6, 2016

Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

JSR CORP2 citations60
US11460767B2Oct 4, 2022

Composition for film formation, film-forming method and directed self-assembly lithography process

JSR CORP0 citations51
US11335559B2May 17, 2022

Pattern-forming method, and composition

JSR CORP0 citations51
US10048586B2Aug 14, 2018

Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound

JSR CORP0 citations51
US9335630B2May 10, 2016

Pattern-forming method, and radiation-sensitive composition

JSR CORP1 citations51
US9158196B2Oct 13, 2015

Radiation-sensitive resin composition and pattern-forming method

JSR CORP1 citations51
US9034559B2May 19, 2015

Pattern-forming method, and radiation-sensitive composition

JSR CORP0 citations51
US9029067B2May 12, 2015

Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same

JSR CORP0 citations51
US8795954B2Aug 5, 2014

Resist pattern-forming method, and radiation-sensitive resin composition

JSR CORP1 citations51
US10691019B2Jun 23, 2020

Pattern-forming method and composition

JSR CORP0 citations41
US9223207B2Dec 29, 2015

Resist pattern-forming method, and radiation-sensitive resin composition

JSR CORP0 citations40
US9164387B2Oct 20, 2015

Pattern-forming method, and radiation-sensitive resin composition

JSR CORP0 citations40
US9760004B2Sep 12, 2017

Radiation-sensitive resin composition and resist pattern-forming method

JSR CORP0 citations39

KMEW CO LTD

1 patent

KIMURA TORU

1 patent

ASANO YUUSUKE

1 patent

WAKAMATSU GOUJI

1 patent