Inventor
FURUKAWA TAIICHI
JP21 patents
⚠️ This page may combine multiple inventors who share the name “FURUKAWA TAIICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
16 patentsUS8815493B2Aug 26, 2014
Resist pattern-forming method, and radiation-sensitive resin composition
JSR CORP4 citations72
US8980539B2Mar 17, 2015
Developer
JSR CORP2 citations62
US9170488B2Oct 27, 2015
Resist pattern-forming method, and radiation-sensitive resin composition
JSR CORP2 citations61
US8993223B2Mar 31, 2015
Resist pattern-forming method
JSR CORP2 citations61
US12560866B2Feb 24, 2026
Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound
JSR CORP0 citations59
US11687003B2Jun 27, 2023
Negative resist pattern-forming method, and composition for upper layer film formation
JSR CORP0 citations59
US12386260B2Aug 12, 2025
Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound
JSR CORP0 citations51
US10025188B2Jul 17, 2018
Resist pattern-forming method
JSR CORP0 citations51
US9335630B2May 10, 2016
Pattern-forming method, and radiation-sensitive composition
JSR CORP1 citations51
US9034559B2May 19, 2015
Pattern-forming method, and radiation-sensitive composition
JSR CORP0 citations51
US8822140B2Sep 2, 2014
Resist pattern-forming method
JSR CORP0 citations51
US8795954B2Aug 5, 2014
Resist pattern-forming method, and radiation-sensitive resin composition
JSR CORP1 citations51
US10073344B2Sep 11, 2018
Negative resist pattern-forming method, and composition for upper layer film formation
JSR CORP0 citations48
US9229323B2Jan 5, 2016
Pattern-forming method
JSR CORP0 citations40
US9223207B2Dec 29, 2015
Resist pattern-forming method, and radiation-sensitive resin composition
JSR CORP0 citations40
US9164387B2Oct 20, 2015
Pattern-forming method, and radiation-sensitive resin composition
JSR CORP0 citations40