Inventor

KO HYUNG-HO

KR20 patents

⚠️ This page may combine multiple inventors who share the name “KO HYUNG-HO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KO HYUNG-HO

SAMSUNG ELECTRONICS CO LTD

PAA-based etchant, methods of using same, and resultant structures

Wet process for semiconductor device fabrication using anode water containing oxidative substances and cathode water containing reductive substances, and anode water and cathode water used in the wet process

Method of cleaning semiconductor substrate

Cleaning solution of silicon germanium layer and cleaning method using the same

Method of manufacturing semiconductor device having storage electrode of capacitor

Methods of fabricating a semiconductor device using a dilute aqueous solution of an ammonia and peroxide mixture

Methods for cleaning a semiconductor substrate having a recess channel region

Phase shift mask

Photomask and method of forming the same and methods of manufacturing electronic device and display device using the photomask

Method of manufacturing photomask

Photomask and method of manufacturing the same

Photomask including ion trapping layer and method of manufacturing semiconductor device using the photomask

Reflective photomask blank, reflective photomask, and integrated circuit device manufactured by using reflective photomask

Apparatus for cleaning photomask

CHOI JAE-HYUCK

Method of megasonic cleaning of an object

Method of megasonic cleaning of an object

SL CORP

Vehicle lamp having a light source unit with chip laterally spaced from optical axis of optical unit and a reflector central axis tilted with respect to the optical axis

JEONG YUN-SONG

Method and apparatus for cleaning photomask

KWON DOO-WON

Methods of fabricating a semiconductor device using a dilute aqueous solution of an ammonia and peroxide mixture

OH JONG-KEUN

Photomasks and methods of manufacturing the same