Inventor
TSAI CHUN-I
TW28 patents
⚠️ This page may combine multiple inventors who share the name “TSAI CHUN-I”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
26 patentsUS10361120B2Jul 23, 2019
Conductive feature formation and structure
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations83
US11062941B2Jul 13, 2021
Contact conductive feature formation and structure
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10580693B2Mar 3, 2020
Contact conductive feature formation and structure
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10504834B2Dec 10, 2019
Contact structure and the method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9978583B2May 22, 2018
Opening fill process and structures formed thereby
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9624576B2Apr 18, 2017
Systems and methods for gap filling improvement
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11929314B2Mar 12, 2024
Interconnect structures including a fin structure and a metal cap
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US12588268B2Mar 24, 2026
Liner-free conductive structures
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12400853B2Aug 26, 2025
Method of forming conductive feature including cleaning step
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12148659B2Nov 19, 2024
Contact conductive feature formation and structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12057397B2Aug 6, 2024
Capping layer for liner-free conductive structures
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12020981B2Jun 25, 2024
Conductive feature formation and structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11955379B2Apr 9, 2024
Metal adhesion layer to promote metal plug adhesion
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11955329B2Apr 9, 2024
Method of forming conductive feature including cleaning step
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11798843B2Oct 24, 2023
Conductive feature formation and structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11676859B2Jun 13, 2023
Contact conductive feature formation and structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11670499B2Jun 6, 2023
Method of forming conductive feature including cleaning step
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11594609B2Feb 28, 2023
Liner-free conductive structures
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11521929B2Dec 6, 2022
Capping layer for liner-free conductive structures
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11195791B2Dec 7, 2021
Method for forming semiconductor contact structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10971396B2Apr 6, 2021
Conductive feature formation and structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US9627313B2Apr 18, 2017
Opening fill process and structure formed thereby
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11817384B2Nov 14, 2023
Interconnect structure and manufacturing method for the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11217524B1Jan 4, 2022
Interconnect structure and manufacturing method for the same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations60
US10283359B2May 7, 2019
Systems and methods for gap filling improvement
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12327788B2Jun 10, 2025
Gate to source drain interconnects
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51