P

Inventor

UZIEL YORAM

IL48 patents
⚠️ This page may combine multiple inventors who share the name “UZIEL YORAM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS ISRAEL LTD

20 patents
US6908567B2Jun 21, 2005

Contaminant removal by laser-accelerated fluid

APPLIED MATERIALS ISRAEL LTD30 citations92
US9666412B1May 30, 2017

Method for charging and imaging an object

APPLIED MATERIALS ISRAEL LTD18 citations83
US9829809B2Nov 28, 2017

System and method for attaching a mask to a mask holder

APPLIED MATERIALS ISRAEL LTD2 citations71
US7428850B2Sep 30, 2008

Integrated in situ scanning electronic microscope review station in semiconductor wafers and photomasks optical inspection system

APPLIED MATERIALS ISRAEL LTD8 citations71
US10049904B1Aug 14, 2018

Method and system for moving a substrate

APPLIED MATERIALS ISRAEL LTD6 citations69
US10177048B2Jan 8, 2019

System for inspecting and reviewing a sample

APPLIED MATERIALS ISRAEL LTD1 citations61
US11189451B2Nov 30, 2021

Charged particle beam source and a method for assembling a charged particle beam source

APPLIED MATERIALS ISRAEL LTD0 citations58
US10886092B2Jan 5, 2021

Charged particle beam source and a method for assembling a charged particle beam source

APPLIED MATERIALS ISRAEL LTD0 citations58
US9302358B2Apr 5, 2016

Chamber elements and a method for placing a chamber at a load position

APPLIED MATERIALS ISRAEL LTD2 citations57
US11177048B2Nov 16, 2021

Method and system for evaluating objects

APPLIED MATERIALS ISRAEL LTD0 citations51
US10060736B1Aug 28, 2018

Near-field sensor height control

APPLIED MATERIALS ISRAEL LTD0 citations50
US9835563B2Dec 5, 2017

Evaluation system and a method for evaluating a substrate

APPLIED MATERIALS ISRAEL LTD0 citations49
US10068748B2Sep 4, 2018

Scanning an object using multiple mechanical stages

APPLIED MATERIALS ISRAEL LTD0 citations48
US10056274B2Aug 21, 2018

System and method for forming a sealed chamber

APPLIED MATERIALS ISRAEL LTD1 citations48
US9587749B2Mar 7, 2017

Slit valve with a pressurized gas bearing

APPLIED MATERIALS ISRAEL LTD1 citations48
US11294164B2Apr 5, 2022

Integrated system and method

APPLIED MATERIALS ISRAEL LTD0 citations47
US9997328B2Jun 12, 2018

System and method for forming a sealed chamber

APPLIED MATERIALS ISRAEL LTD1 citations47
US8772737B2Jul 8, 2014

Conductive element for electrically coupling an EUVL mask to a supporting chuck

APPLIED MATERIALS ISRAEL LTD0 citations47
US9297692B2Mar 29, 2016

System and method for inspecting a sample using landing lens

APPLIED MATERIALS ISRAEL LTD0 citations41
US10446434B2Oct 15, 2019

Chuck for supporting a wafer

APPLIED MATERIALS ISRAEL LTD0 citations39

KLA CORP

17 patents
US11378394B1Jul 5, 2022

On-the-fly scatterometry overlay metrology target

KLA CORP7 citations80
US11899375B2Feb 13, 2024

Massive overlay metrology sampling with multiple measurement columns

KLA CORP2 citations72
US11409205B2Aug 9, 2022

Non-orthogonal target and method for using the same in measuring misregistration of semiconductor devices

KLA CORP2 citations72
US12001148B2Jun 4, 2024

Enhancing performance of overlay metrology

KLA CORP2 citations70
US11967535B2Apr 23, 2024

On-product overlay targets

KLA CORP0 citations62
US11644419B2May 9, 2023

Measurement of properties of patterned photoresist

KLA CORP0 citations62
US12379669B2Aug 5, 2025

Massive overlay metrology sampling with multiple measurement columns

KLA CORP0 citations61
US12327741B2Jun 10, 2025

Oscillating secondary stage for frame-mode overlay metrology

KLA CORP0 citations59
US11592755B2Feb 28, 2023

Enhancing performance of overlay metrology

KLA CORP1 citations59
US12370581B2Jul 29, 2025

In-situ process chamber chuck cleaning by cleaning substrate

KLA CORP0 citations56
US11638938B2May 2, 2023

In situ process chamber chuck cleaning by cleaning substrate

KLA CORP0 citations56
US11607716B1Mar 21, 2023

Systems and methods for chuck cleaning

KLA CORP0 citations56
US11933717B2Mar 19, 2024

Sensitive optical metrology in scanning and static modes

KLA CORP0 citations51
US11713959B2Aug 1, 2023

Overlay metrology using spectroscopic phase

KLA CORP0 citations51
US11637030B2Apr 25, 2023

Multi-stage, multi-zone substrate positioning systems

KLA CORP0 citations49
US12131959B2Oct 29, 2024

Systems and methods for improved metrology for semiconductor device wafers

KLA CORP0 citations48
US12487190B2Dec 2, 2025

System and method for isolation of specific fourier pupil frequency in overlay metrology

KLA CORP0 citations47

APPLIED MATERIALS INC

4 patents

KLA INSTR CORP

2 patents

ORAMIR SEMICONDUCTOR LTD

2 patents

KLA TENCOR CORP

1 patent

LANGER MOSHE

1 patent

YOZMOT GFANOT INITIATIVE CT

1 patent