Inventor
OKAZAKI SATOSHI
JP55 patents
⚠️ This page may combine multiple inventors who share the name “OKAZAKI SATOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
41 patentsUS4431789AFeb 14, 1984
Novel organopolysiloxane having alcoholic hydroxy groups and a method for the preparation thereof
SHINETSU CHEMICAL CO148 citations99
US7179545B2Feb 20, 2007
Halftone phase shift mask blank, and method of manufacture
SHINETSU CHEMICAL CO20 citations93
US7771893B2Aug 10, 2010
Photomask blank, photomask and fabrication method thereof
SHINETSU CHEMICAL CO28 citations92
US7767366B2Aug 3, 2010
Photomask blank and photomask
SHINETSU CHEMICAL CO34 citations92
US7736824B2Jun 15, 2010
Photomask blank, photomask, and method of manufacture
SHINETSU CHEMICAL CO26 citations92
US6383944B1May 7, 2002
Micropatterning method
SHINETSU CHEMICAL CO22 citations92
US5773200AJun 30, 1998
Positive resist composition suitable for lift-off technique and pattern forming method
SHINETSU CHEMICAL CO22 citations92
US5422221AJun 6, 1995
Resist compositions
SHINETSU CHEMICAL CO28 citations92
US7790339B2Sep 7, 2010
Photomask blank
SHINETSU CHEMICAL CO8 citations84
US7691546B2Apr 6, 2010
Photomask blank and photomask
SHINETSU CHEMICAL CO10 citations84
US7625676B2Dec 1, 2009
Photomask blank, photomask and fabrication method thereof
SHINETSU CHEMICAL CO13 citations84
US7618753B2Nov 17, 2009
Photomask blank, photomask and method for producing those
SHINETSU CHEMICAL CO8 citations84
US6511778B2Jan 28, 2003
Phase shift mask blank, phase shift mask and method of manufacture
SHINETSU CHEMICAL CO15 citations84
US8012654B2Sep 6, 2011
Photomask blank and photomask
SHINETSU CHEMICAL CO11 citations83
US8003284B2Aug 23, 2011
Photomask blank and photomask
SHINETSU CHEMICAL CO9 citations83
US6666957B2Dec 23, 2003
Magnetron sputtering system and photomask blank production method based on the same
SHINETSU CHEMICAL CO8 citations74
US6503669B2Jan 7, 2003
Photomask blank, photomask and method of manufacture
SHINETSU CHEMICAL CO8 citations74
US6242151B1Jun 5, 2001
Polymers, resist compositions and patterning method
SHINETSU CHEMICAL CO9 citations74
US6221989B1Apr 24, 2001
Polymers and positive resist compositions
SHINETSU CHEMICAL CO8 citations74
US6218069B1Apr 17, 2001
Photosensitive resin composition and making process
SHINETSU CHEMICAL CO11 citations74
US6790129B2Sep 14, 2004
Method for polishing angular substrates
SHINETSU CHEMICAL CO7 citations73
US6641958B2Nov 4, 2003
Phase shift mask blank, phase shift mask, and methods of manufacture
SHINETSU CHEMICAL CO6 citations73
US7622227B2Nov 24, 2009
Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof
SHINETSU CHEMICAL CO3 citations63
US7122280B2Oct 17, 2006
Angular substrates
SHINETSU CHEMICAL CO4 citations63
US6589699B2Jul 8, 2003
Photomask blank and photomask
SHINETSU CHEMICAL CO4 citations63
US6503668B2Jan 7, 2003
Phase shift mask blank, phase shift mask, and method of manufacture
SHINETSU CHEMICAL CO4 citations63
US8007964B2Aug 30, 2011
Photomask blank and photomask
SHINETSU CHEMICAL CO2 citations62
US7556892B2Jul 7, 2009
Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method
SHINETSU CHEMICAL CO3 citations62
US7037625B2May 2, 2006
Phase shift mask blank and method of manufacture
SHINETSU CHEMICAL CO2 citations62
US6514642B2Feb 4, 2003
Phase shift mask and method of manufacture
SHINETSU CHEMICAL CO5 citations62
US7625677B2Dec 1, 2009
Half-tone stacked film, photomask-blank, photomask and fabrication method thereof
SHINETSU CHEMICAL CO3 citations61
US6733930B2May 11, 2004
Photomask blank, photomask and method of manufacture
SHINETSU CHEMICAL CO2 citations61
US7351505B2Apr 1, 2008
Phase shift mask blank, phase shift mask, and pattern transfer method
SHINETSU CHEMICAL CO3 citations60
US7179567B2Feb 20, 2007
Phase shift mask blank, phase shift mask, and method of manufacture
SHINETSU CHEMICAL CO3 citations58
US7622228B2Nov 24, 2009
Halftone phase shift mask blank, and method of manufacture
SHINETSU CHEMICAL CO1 citations52
US7425390B2Sep 16, 2008
Preparation of halftone phase shift mask blank
SHINETSU CHEMICAL CO0 citations52
US7419749B2Sep 2, 2008
Halftone phase shift mask blank, halftone phase shift mask and their preparation
SHINETSU CHEMICAL CO1 citations52
US7344806B2Mar 18, 2008
Method of producing phase shift mask blank, method of producing phase shift mask, phase shift mask blank, and phase shift mask
SHINETSU CHEMICAL CO1 citations52
US6352801B1Mar 5, 2002
Phase shift mask and making process
SHINETSU CHEMICAL CO1 citations52
US5169440ADec 8, 1992
Silicon carbide membrane for X-ray lithography and method for the preparation thereof
SHINETSU CHEMICAL CO0 citations52
US7598004B2Oct 6, 2009
Film-depositing target and preparation of phase shift mask blank
SHINETSU CHEMICAL CO0 citations51
TOPPAN PRINTING CO LTD
2 patentsJSR CORP
2 patentsUS11320735B2May 3, 2022
Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, carboxylic acid salt and carboxylic acid
JSR CORP1 citations61
US12386260B2Aug 12, 2025
Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound
JSR CORP0 citations51
NGK SPARK PLUG CO
2 patentsDAINIPPON PRINTING CO LTD
1 patentSHIN ESTU CHEMICAL CO LTD
1 patentRIKEN
1 patentShowing the top 50 of 55 patents by PatentIndex Score.