Inventor

CHEN XINGLONG

US58 patents

⚠️ This page may combine multiple inventors who share the name “CHEN XINGLONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHEN XINGLONG

APPLIED MATERIALS INC

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Dry-etch selectivity

Semiconductor processing with DC assisted RF power for improved control

Enhanced etching processes using remote plasma sources

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Semiconductor processing system and methods using capacitively coupled plasma

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Dry-etch selectivity

Semiconductor processing with DC assisted RF power for improved control

Chemical control features in wafer process equipment

Particle generation suppressor by DC bias modulation

Chemical control features in wafer process equipment

Chemical control features in wafer process equipment

Pedestal with multi-zone temperature control and multiple purge capabilities

Pedestal with multi-zone temperature control and multiple purge capabilities

Semiconductor processing systems having multiple plasma configurations

Particle generation suppresor by DC bias modulation

Semiconductor processing systems having multiple plasma configurations

Particle generation suppresor by DC bias modulation

RPS assisted RF plasma source for semiconductor processing

RPS assisted RF plasma source for semiconductor processing

RPS assisted RF plasma source for semiconductor processing

Internal balanced coil for inductively coupled high density plasma processing chamber

Internal balanced coil for inductively coupled high density plasma processing chamber

Flow control features of CVD chambers

Enhanced etching processes using remote plasma sources

Insulated semiconductor faceplate designs

Flow control features of CVD chambers

Chemical control features in wafer process equipment

Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing

PETROCHINA CO LTD

Gas flow control valve and mounting method for gas flow control valve

Gasflow distribution device, gas distributor, pipe string and method for separate-layer gas injection

Phase power device and fluid experiment system

System and method of performing oil displacement by water-gas dispersion system

Ultrasonic microbubble generation method, apparatus and system

Microbubble generation device and equipment

SAMSUNG ELECTRONICS CO LTD

Wafer clamping apparatus

Methods of manufacturing a semiconductor device

Etching method using plasma, and method of fabricating semiconductor device including the etching method

CHUC KIEN N

Flow control features of CVD chambers

YANG JANG GYOO

Semiconductor processing system and methods using capacitively coupled plasma

RASHEED MUHAMMAD M

Low profile process kit

XINJIANG TECHNICAL INST OF PHYSICS & CHEMISTRY CHINESE ACADEMY OF SCIENCES

Calcium metaborate birefringent crystal, preparation method and use thereof

LUBOMIRSKY DMITRY

Method of making an electrostatic chuck with reduced plasma penetration and arcing

NARENDRNATH KADTHALA RAMAYA

Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing