Inventor

VENKATARAMAN SHANKAR

US109 patents

⚠️ This page may combine multiple inventors who share the name “VENKATARAMAN SHANKAR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VENKATARAMAN SHANKAR

APPLIED MATERIALS INC

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Integrated bit-line airgap formation and gate stack post clean

Processing systems and methods for halide scavenging

Semiconductor processing with DC assisted RF power for improved control

Enhanced etching processes using remote plasma sources

Selective etch of silicon nitride

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Semiconductor processing system and methods using capacitively coupled plasma

Processing systems and methods for halide scavenging

Processing systems and methods for halide scavenging

Selective etch of silicon nitride

Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compound

Semiconductor processing with DC assisted RF power for improved control

Chemical control features in wafer process equipment

Integrated bit-line airgap formation and gate stack post clean

High temperature chuck for plasma processing systems

Highly selective doped oxide removal method

Integrated oxide recess and floating gate fin trimming

Chemical control features in wafer process equipment

Deposition-plasma cure cycle process to enhance film quality of silicon dioxide

Method and apparatus for cleaning a CVD chamber

Heated gas distribution plate for a processing chamber

Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF power

Method of depositing low dielectric constant silicon carbide layers

CVD plasma assisted lower dielectric constant sicoh film

Chemical control features in wafer process equipment

Method of depositing dielectric materials in damascene applications

Integration of remote plasma generator with semiconductor processing chamber

Accelerated plasma clean

Low-thermal-budget gapfill process

Method and apparatus for fluid flow control

Method of modifying interlayer adhesion

Semiconductor processing systems having multiple plasma configurations

Stress management for tensile films

Apparatus for distributing gases in a chemical vapor deposition system

Method of modifying interlayer adhesion

Method of depositing low dielectric constant silicon carbide layers

Gap filling with a composite layer

CISCO TECH INC

Efficient framing procedure for variable length packets

Method and system for transporting faults across a network

SAPRE KEDAR

Double patterning etching process

LIANG JINGMEI

Formation of silicon oxide using non-carbon flowable CVD processes

TANG JING

Invertable pattern loading with dry etch

BHATIA SIDHARTH

Two silicon-containing precursors for gapfill enhancing dielectric liner

CHUC KIEN N

Flow control features of CVD chambers

MANDREKAR TUSHAR V

Method for doping non-planar transistors

WANG LINLIN

In-situ ozone cure for radical-component CVD