Inventor
KE XIANHUA
CN3 patents
Patents
3 patentsUS12339581B2Jun 24, 2025
Photolithographic mask optimization method and system without border defects
WUHAN YUWEI OPTICAL SOFTWARE CO LTD0 citations44
US12306543B2May 20, 2025
Optical imaging method, device and system for photolithography system
WUHAN YUWEI OPTICAL SOFTWARE CO LTD0 citations44
US12050407B2Jul 30, 2024
Light source calibration method and system employed in source mask optimization
WUHAN YUWEI OPTICAL SOFTWARE CO LTD0 citations44