Inventor
ALBAREDE LUC
US20 patents
⚠️ This page may combine multiple inventors who share the name “ALBAREDE LUC”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LAM RES CORP
16 patentsUS10134569B1Nov 20, 2018
Method and apparatus for real-time monitoring of plasma chamber wall condition
LAM RES CORP22 citations93
US9337000B2May 10, 2016
Control of impedance of RF return path
LAM RES CORP32 citations93
US9401264B2Jul 26, 2016
Control of impedance of RF delivery path
LAM RES CORP22 citations92
US10249476B2Apr 2, 2019
Control of impedance of RF return path
LAM RES CORP12 citations83
US10157730B2Dec 18, 2018
Control of impedance of RF delivery path
LAM RES CORP6 citations83
US9119283B2Aug 25, 2015
Chamber matching for power control mode
LAM RES CORP10 citations83
US9735069B2Aug 15, 2017
Method and apparatus for determining process rate
LAM RES CORP5 citations72
US9548189B2Jan 17, 2017
Plasma etching systems and methods using empirical mode decomposition
LAM RES CORP2 citations72
US10903050B2Jan 26, 2021
Endpoint sensor based control including adjustment of an edge ring parameter for each substrate processed to maintain etch rate uniformity
LAM RES CORP4 citations71
US10302553B2May 28, 2019
Gas exhaust by-product measurement system
LAM RES CORP4 citations71
US11056322B2Jul 6, 2021
Method and apparatus for determining process rate
LAM RES CORP0 citations62
US9107284B2Aug 11, 2015
Chamber matching using voltage control mode
LAM RES CORP3 citations62
US12580325B2Mar 17, 2026
Phased array antennas and methods for controlling uniformity in processing a substrate
LAM RES CORP0 citations51
US10504704B2Dec 10, 2019
Plasma etching systems and methods using empirical mode decomposition
LAM RES CORP0 citations51
US10930478B2Feb 23, 2021
Apparatus with optical cavity for determining process rate
LAM RES CORP0 citations44
US10784174B2Sep 22, 2020
Method and apparatus for determining etch process parameters
LAM RES CORP0 citations40