Inventor
OH JUNG-MIN
KR58 patents
⚠️ This page may combine multiple inventors who share the name “OH JUNG-MIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
29 patentsUS10679843B2Jun 9, 2020
Method of treating substrates using supercritical fluids
SAMSUNG ELECTRONICS CO LTD7 citations84
US7498217B2Mar 3, 2009
Methods of manufacturing semiconductor memory devices with unit cells having charge trapping layers
SAMSUNG ELECTRONICS CO LTD9 citations84
US7445314B2Nov 4, 2008
Piezoelectric ink-jet printhead and method of manufacturing a nozzle plate of the same
SAMSUNG ELECTRONICS CO LTD9 citations84
US10083829B2Sep 25, 2018
Apparatus for treating substrates using supercritical fluids, substrate treatment system including the same and method of treating substrates using the same
SAMSUNG ELECTRONICS CO LTD4 citations73
US9831081B2Nov 28, 2017
Method for treating substrate
SAMSUNG ELECTRONICS CO LTD3 citations73
US10991600B2Apr 27, 2021
Process chamber and substrate processing apparatus including the same
SAMSUNG ELECTRONICS CO LTD2 citations72
US9941110B2Apr 10, 2018
Manufacturing method and fluid supply system for treating substrate
SAMSUNG ELECTRONICS CO LTD3 citations72
US9627233B2Apr 18, 2017
Substrate treating apparatus
SAMSUNG ELECTRONICS CO LTD4 citations72
US9524864B2Dec 20, 2016
Manufacturing method and fluid supply system for treating substrate
SAMSUNG ELECTRONICS CO LTD3 citations72
US10388537B2Aug 20, 2019
Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the same
SAMSUNG ELECTRONICS CO LTD3 citations71
US9852921B2Dec 26, 2017
Substrate treating apparatus and method of treating substrate
SAMSUNG ELECTRONICS CO LTD2 citations71
US9829952B2Nov 28, 2017
Processor that has its operating frequency controlled in view of power consumption during operation and semiconductor device including the same
SAMSUNG ELECTRONICS CO LTD3 citations70
US11390805B2Jul 19, 2022
Etching composition and method for manufacturing semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD3 citations68
US7435644B2Oct 14, 2008
Method of manufacturing capacitor of semiconductor device
SAMSUNG ELECTRONICS CO LTD3 citations63
US11610788B2Mar 21, 2023
Process chamber and substrate processing apparatus including the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US11227761B2Jan 18, 2022
Method of removing chemicals from a substrate
SAMSUNG ELECTRONICS CO LTD0 citations62
US7985999B2Jul 26, 2011
Semiconductor device having capacitor
SAMSUNG ELECTRONICS CO LTD2 citations62
US7820508B2Oct 26, 2010
Semiconductor device having capacitor and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD3 citations62
US7459370B2Dec 2, 2008
Method of fabricating semiconductor memory device having plurality of storage node electrodes
SAMSUNG ELECTRONICS CO LTD2 citations62
US11091696B2Aug 17, 2021
Etching composition and method for manufacturing semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD1 citations60
US12543337B2Feb 3, 2026
Oxide film coating solution and semiconductor device manufacturing method using the same
SAMSUNG ELECTRONICS CO LTD0 citations58
US12297385B2May 13, 2025
Etching compositions and methods for fabricating semiconductor devices by using the same
SAMSUNG ELECTRONICS CO LTD0 citations56
US9394509B2Jul 19, 2016
Cleaning solution composition and method of cleaning semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD0 citations52
US7704828B2Apr 27, 2010
Method of fabricating a semiconductor device
SAMSUNG ELECTRONICS CO LTD1 citations52
US10186427B2Jan 22, 2019
Substrate treating apparatus
SAMSUNG ELECTRONICS CO LTD0 citations50
US10837115B2Nov 17, 2020
Pre-treatment composition before etching SiGe and method of fabricating semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD0 citations49
US10795263B2Oct 6, 2020
Compositions for removing photoresist
SAMSUNG ELECTRONICS CO LTD0 citations49
US10025192B2Jul 17, 2018
Methods of manufacturing semiconductor devices using a composition for removing photoresist and methods of removing photoresist from a semiconductor substrate
SAMSUNG ELECTRONICS CO LTD0 citations49
US11149234B2Oct 19, 2021
Cleaning composition, cleaning apparatus, and method of fabricating semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD0 citations47
LEE HYO-SAN
3 patentsUS8790470B2Jul 29, 2014
Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods
LEE HYO-SAN8 citations81
US8585917B2Nov 19, 2013
Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods
LEE HYO-SAN5 citations81
US8084367B2Dec 27, 2011
Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods
LEE HYO-SAN9 citations81
KANG DAE-HYUK
2 patentsCHO YONG-JHIN
2 patentsSAMSUNG SDI CO LTD
2 patentsLIM JAE-WON
2 patentsUNIV PENNSYLVANIA
2 patentsYOON JUN-HO
1 patentKIM NOH-SUN
1 patentHAN CHOONG SOO
1 patentAVAGO TECH INT SALES PTE LID
1 patentAVAGO TECHNOLOGIES GENERAL IP
1 patentDEININGER THOMAS
1 patentUNIV MASSACHUSETTS
1 patentKOREA INST GEOSCIENCE & MINERA
1 patentShowing the top 50 of 58 patents by PatentIndex Score.