P

Inventor

OH JUNG-MIN

KR58 patents
⚠️ This page may combine multiple inventors who share the name “OH JUNG-MIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

29 patents
US10679843B2Jun 9, 2020

Method of treating substrates using supercritical fluids

SAMSUNG ELECTRONICS CO LTD7 citations84
US7498217B2Mar 3, 2009

Methods of manufacturing semiconductor memory devices with unit cells having charge trapping layers

SAMSUNG ELECTRONICS CO LTD9 citations84
US7445314B2Nov 4, 2008

Piezoelectric ink-jet printhead and method of manufacturing a nozzle plate of the same

SAMSUNG ELECTRONICS CO LTD9 citations84
US10083829B2Sep 25, 2018

Apparatus for treating substrates using supercritical fluids, substrate treatment system including the same and method of treating substrates using the same

SAMSUNG ELECTRONICS CO LTD4 citations73
US9831081B2Nov 28, 2017

Method for treating substrate

SAMSUNG ELECTRONICS CO LTD3 citations73
US10991600B2Apr 27, 2021

Process chamber and substrate processing apparatus including the same

SAMSUNG ELECTRONICS CO LTD2 citations72
US9941110B2Apr 10, 2018

Manufacturing method and fluid supply system for treating substrate

SAMSUNG ELECTRONICS CO LTD3 citations72
US9627233B2Apr 18, 2017

Substrate treating apparatus

SAMSUNG ELECTRONICS CO LTD4 citations72
US9524864B2Dec 20, 2016

Manufacturing method and fluid supply system for treating substrate

SAMSUNG ELECTRONICS CO LTD3 citations72
US10388537B2Aug 20, 2019

Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the same

SAMSUNG ELECTRONICS CO LTD3 citations71
US9852921B2Dec 26, 2017

Substrate treating apparatus and method of treating substrate

SAMSUNG ELECTRONICS CO LTD2 citations71
US9829952B2Nov 28, 2017

Processor that has its operating frequency controlled in view of power consumption during operation and semiconductor device including the same

SAMSUNG ELECTRONICS CO LTD3 citations70
US11390805B2Jul 19, 2022

Etching composition and method for manufacturing semiconductor device using the same

SAMSUNG ELECTRONICS CO LTD3 citations68
US7435644B2Oct 14, 2008

Method of manufacturing capacitor of semiconductor device

SAMSUNG ELECTRONICS CO LTD3 citations63
US11610788B2Mar 21, 2023

Process chamber and substrate processing apparatus including the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US11227761B2Jan 18, 2022

Method of removing chemicals from a substrate

SAMSUNG ELECTRONICS CO LTD0 citations62
US7985999B2Jul 26, 2011

Semiconductor device having capacitor

SAMSUNG ELECTRONICS CO LTD2 citations62
US7820508B2Oct 26, 2010

Semiconductor device having capacitor and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD3 citations62
US7459370B2Dec 2, 2008

Method of fabricating semiconductor memory device having plurality of storage node electrodes

SAMSUNG ELECTRONICS CO LTD2 citations62
US11091696B2Aug 17, 2021

Etching composition and method for manufacturing semiconductor device using the same

SAMSUNG ELECTRONICS CO LTD1 citations60
US12543337B2Feb 3, 2026

Oxide film coating solution and semiconductor device manufacturing method using the same

SAMSUNG ELECTRONICS CO LTD0 citations58
US12297385B2May 13, 2025

Etching compositions and methods for fabricating semiconductor devices by using the same

SAMSUNG ELECTRONICS CO LTD0 citations56
US9394509B2Jul 19, 2016

Cleaning solution composition and method of cleaning semiconductor device using the same

SAMSUNG ELECTRONICS CO LTD0 citations52
US7704828B2Apr 27, 2010

Method of fabricating a semiconductor device

SAMSUNG ELECTRONICS CO LTD1 citations52
US10186427B2Jan 22, 2019

Substrate treating apparatus

SAMSUNG ELECTRONICS CO LTD0 citations50
US10837115B2Nov 17, 2020

Pre-treatment composition before etching SiGe and method of fabricating semiconductor device using the same

SAMSUNG ELECTRONICS CO LTD0 citations49
US10795263B2Oct 6, 2020

Compositions for removing photoresist

SAMSUNG ELECTRONICS CO LTD0 citations49
US10025192B2Jul 17, 2018

Methods of manufacturing semiconductor devices using a composition for removing photoresist and methods of removing photoresist from a semiconductor substrate

SAMSUNG ELECTRONICS CO LTD0 citations49
US11149234B2Oct 19, 2021

Cleaning composition, cleaning apparatus, and method of fabricating semiconductor device using the same

SAMSUNG ELECTRONICS CO LTD0 citations47

LEE HYO-SAN

3 patents

KANG DAE-HYUK

2 patents

CHO YONG-JHIN

2 patents

SAMSUNG SDI CO LTD

2 patents

LIM JAE-WON

2 patents

UNIV PENNSYLVANIA

2 patents

YOON JUN-HO

1 patent

KIM NOH-SUN

1 patent

HAN CHOONG SOO

1 patent

AVAGO TECH INT SALES PTE LID

1 patent

AVAGO TECHNOLOGIES GENERAL IP

1 patent

DEININGER THOMAS

1 patent

UNIV MASSACHUSETTS

1 patent

KOREA INST GEOSCIENCE & MINERA

1 patent

Showing the top 50 of 58 patents by PatentIndex Score.