Inventor
CHEN MING-TE
TW41 patents
⚠️ This page may combine multiple inventors who share the name “CHEN MING-TE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
23 patentsUS9543438B2Jan 10, 2017
Contact resistance reduction technique
TAIWAN SEMICONDUCTOR MFG CO LTD16 citations92
US11670553B2Jun 6, 2023
Gate stack treatment
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11088029B2Aug 10, 2021
Gate stack treatment
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations71
US9512519B2Dec 6, 2016
Atomic layer deposition apparatus and method
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations70
US11978675B2May 7, 2024
Method of manufacturing semiconductor devices and semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11183431B2Nov 23, 2021
Method of manufacturing semiconductor devices and semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12300549B2May 13, 2025
Gate stack treatment
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12142682B2Nov 12, 2024
Method of manufacturing semiconductor devices and semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11081584B2Aug 3, 2021
Method of manufacturing semiconductor devices using a capping layer in forming gate electrode and semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US12170327B2Dec 17, 2024
Semiconductor structure and manufacturing method of the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11232953B2Jan 25, 2022
Method of manufacturing a semiconductor device and a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11329160B2May 10, 2022
FinFET gate structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US10340269B2Jul 2, 2019
Contact resistance reduction technique
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9786470B2Oct 10, 2017
Ion beam generator, ion implantation apparatus including an ion beam generator and method of using an ion beam generator
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9606181B2Mar 28, 2017
Processing apparatus, ion implantation apparatus and ion implantation method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10858736B2Dec 8, 2020
Atomic layer deposition method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
US9589804B2Mar 7, 2017
Method of forming finFET gate oxide
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
US9982338B2May 29, 2018
High-throughput system and method for post-implantation single wafer warm-up
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations45
US9663854B2May 30, 2017
High-throughput system and method for post-implantation single wafer warm-up
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations45
US9721853B2Aug 1, 2017
System and method for forming a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations42
US10121637B2Nov 6, 2018
Multi-platen ion implanter and method for implanting multiple substrates simultaneously
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations41
US9781994B2Oct 10, 2017
Wafer cleaning
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations36
US9437433B2Sep 6, 2016
Method and apparatus for cooling wafer in ion implantation process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations34
TAIWAN SEMICONDUCTOR MFG
8 patentsUS8021992B2Sep 20, 2011
High aspect ratio gap fill application using high density plasma chemical vapor deposition
TAIWAN SEMICONDUCTOR MFG21 citations90
US9209243B2Dec 8, 2015
Method of forming a shallow trench isolation structure
TAIWAN SEMICONDUCTOR MFG3 citations60
US9267982B2Feb 23, 2016
Processing apparatus and ion implantation apparatus
TAIWAN SEMICONDUCTOR MFG0 citations51
US8975155B2Mar 10, 2015
Method of forming a shallow trench isolation structure
TAIWAN SEMICONDUCTOR MFG1 citations49
US6851168B2Feb 8, 2005
Collar removing clamp for HDP chamber
TAIWAN SEMICONDUCTOR MFG0 citations47
US9378990B2Jun 28, 2016
Adjusting intensity of laser beam during laser operation on a semiconductor device
TAIWAN SEMICONDUCTOR MFG0 citations42
US9070591B2Jun 30, 2015
Adjusting intensity of laser beam during laser operation on a semiconductor device
TAIWAN SEMICONDUCTOR MFG0 citations42
US9196452B2Nov 24, 2015
Methods and apparatus for carbon ion source head
TAIWAN SEMICONDUCTOR MFG0 citations41
UNITED MICROELECTRONICS CORP
3 patentsUS7468326B2Dec 23, 2008
Method of cleaning a wafer
UNITED MICROELECTRONICS CORP22 citations91
US7229896B2Jun 12, 2007
STI process for eliminating silicon nitride liner induced defects
UNITED MICROELECTRONICS CORP24 citations91
US7606021B2Oct 20, 2009
Metal-insulator-metal capacitor and method for fabricating the same
UNITED MICROELECTRONICS CORP4 citations57