Inventor

EMOTO KEIJI

JP52 patents

⚠️ This page may combine multiple inventors who share the name “EMOTO KEIJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

EMOTO KEIJI

CANON KK

Stage system with driving mechanism, and exposure apparatus having the same

Temperature adjustment apparatus, exposure apparatus having the temperature adjustment apparatus, and semiconductor device manufacturing method

Stage system with driving mechanism, and exposure apparatus having the same

Substrate holding system and exposure apparatus using the same

Linear motor, stage apparatus, exposure apparatus, and device manufacturing apparatus

Linear motor, stage apparatus, exposure apparatus, and device manufacturing method

Temperature adjustment apparatus, exposure apparatus having the temperature adjustment apparatus, and semiconductor device manufacturing method

Exposure apparatus

Linear motor, stage apparatus, exposure apparatus, and device manufacturing method

Positioning apparatus

Substrate holding technique

Stage device and exposure apparatus

Temperature adjustment apparatus, exposure apparatus having the temperature adjustment apparatus, and semiconductor device manufacturing method

Exposure apparatus

Pipe structure, alignment apparatus, electron beam lithography apparatus, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory

Substrate processing apparatus

Linear motor and exposure apparatus using the same

Exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method

Substrate processing apparatus

Substrate holding system and exposure apparatus using the same

Positioning system and linear motor

Sample temperature adjusting system

Substrate processing apparatus

Pattern forming method and method of manufacturing article

Imprint apparatus, imprint method, and article manufacturing method

Imprint apparatus and imprint method, and article manufacturing method

Imprint apparatus, method of operating the same, and method of manufacturing article

Exposure apparatus

Processing apparatus for processing object in vessel

Substrate holding system and exposure apparatus using the same

Exposure apparatus

Liquid-immersion exposure method and liquid-immersion exposure apparatus

Substrate holding system and exposure apparatus using the same

Stage apparatus, plane motor, and device manufacturing method

Alignment apparatus and exposure apparatus

Alignment apparatus and exposure apparatus

Processing apparatus for processing object in vessel

Exposure apparatus and method of manufacturing article

Exposure apparatus and method of manufacturing article

Exposing apparatus and method for manufacturing article

Pattern formation method and article manufacturing method

Processing machine system and method of positioning processing machines

Exposure apparatus

Interferometric measurement of rotation of stage apparatus and adjustment method thereof, exposure apparatus and method of manufacturing device

SATO HITOSHI

Stage device, exposure apparatus, and microdevice manufacturing method

Stage device including a heat insulating sheet supported by an auxiliary member

EMOTO KEIJI

Exposure apparatus and method of manufacturing device

Exposure apparatus having a vibration suppressing feature and method of manufacturing device using the exposure apparatus

HITACHI HIGH TECH CORP

Exhaust apparatus and control method for same, and vacuum-use hydrostatic bearing

FURUMOTO MITSUHIRO

Lithography system and lithography method