Inventor

BHATTACHARYYA KAUSTUVE

NL57 patents

⚠️ This page may combine multiple inventors who share the name “BHATTACHARYYA KAUSTUVE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BHATTACHARYYA KAUSTUVE

ASML NETHERLANDS BV

Metrology method, computer product and system

Method of designing metrology targets, substrates having metrology targets, method of measuring overlay, and device manufacturing method

Metrology method, computer product and system

Metrology recipe selection

Determination of stack difference and correction using stack difference

Method of designing metrology targets, substrates having metrology targets, method of measuring overlay, and device manufacturing method

Metrology method and apparatus, lithographic system, device manufacturing method and substrate

Metrology method, target and substrate

Metrology method, target and substrate

Metrology method, target and substrate

Recipe selection based on inter-recipe consistency

Methods and apparatus for monitoring a lithographic manufacturing process

Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method

Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method

Metrology method, computer product and system

Metrology method, target and substrate

Metrology method, patterning device, apparatus and computer program

Metrology method, patterning device, apparatus and computer program

Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method

Metrology method and associated metrology and lithographic apparatuses

Correction using stack difference

Inspection method, lithographic apparatus, mask and substrate

Method and apparatus for predicting performance of a metrology system

System and method for measurement of alignment

Mark position determination method

Metrology method and apparatus and computer program

Metrology method, target and substrate

Metrology method and apparatus and computer program

Illumination and detection apparatus for a metrology apparatus

Method for overlay metrology and apparatus thereof

Method for inferring a local uniformity metric

Metrology method and apparatus, lithographic system, device manufacturing method and substrate

Metrology recipe selection

Metrology in lithographic processes

Recipe selection based on inter-recipe consistency

Recipe selection based on inter-recipe consistency

Inspection method, lithographic apparatus, mask and substrate

Method and apparatus for inspection and metrology

Metrology method

Method and apparatus for inspection and metrology

Method and system for determining information about a target structure

Method to determine a patterning process parameter

Method for monitoring lithographic apparatus

Methods and apparatus for monitoring a lithographic manufacturing process

Determination of stack difference and correction using stack difference

Metrology method and lithographic method, lithographic cell and computer program

DEN BOEF ARIE JEFFREY

Method and apparatus for determining an overlay error

BHATTACHARYYA KAUSTUVE

Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method

KLA TENCOR TECH CORP

Detailed grey scale inspection method and apparatus

VAN DER SCHAAR MAURITS

Substrate and patterning device for use in metrology, metrology method and device manufacturing method