Inventor

VAN BUEL HENRICUS WILHELMUS MARIA

NL18 patents

⚠️ This page may combine multiple inventors who share the name “VAN BUEL HENRICUS WILHELMUS MARIA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VAN BUEL HENRICUS WILHELMUS MARIA

ASML NETHERLANDS BV

Metrology method, target and substrate

Metrology method, target and substrate

Metrology method, target and substrate

Alignment and alignment marks

Method and system for 3D alignment in wafer scale integration

Metrology method, target and substrate

Optimization of target arrangement and associated target

Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method

Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method

Metrology method, target and substrate

Substrate table with windows, method of measuring a position of a substrate and a lithographic apparatus

Apparatus for and a method of removing contaminant particles from a component of an apparatus

Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program

Lithographic apparatus and device manufacturing method

Inspection apparatus for measuring properties of a target structure, methods of operating an optical system, method of manufacturing devices

Lithographic apparatus and method

BEST KEITH FRANK

Lithographic apparatus and method

VAN BUEL HENRICUS WILHELMUS MARIA

Sensor, a table and lithographic apparatus