Inventor
SMILDE HENDRIK JAN HIDDE
NL40 patents
⚠️ This page may combine multiple inventors who share the name “SMILDE HENDRIK JAN HIDDE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
31 patentsUS9946167B2Apr 17, 2018
Metrology method and inspection apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV18 citations94
US9134256B2Sep 15, 2015
Metrology method and apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV29 citations93
US8994944B2Mar 31, 2015
Methods and scatterometers, lithographic systems, and lithographic processing cells
ASML NETHERLANDS BV24 citations92
US9714827B2Jul 25, 2017
Metrology method and apparatus, lithographic system, device manufacturing method and substrate
ASML NETHERLANDS BV6 citations84
US9255892B2Feb 9, 2016
Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus
ASML NETHERLANDS BV6 citations84
US11204239B2Dec 21, 2021
Metrology method, target and substrate
ASML NETHERLANDS BV7 citations83
US10718604B2Jul 21, 2020
Metrology method, target and substrate
ASML NETHERLANDS BV6 citations83
US10386176B2Aug 20, 2019
Metrology method, target and substrate
ASML NETHERLANDS BV5 citations83
US9910366B2Mar 6, 2018
Metrology method and apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV9 citations83
US10162271B2Dec 25, 2018
Metrology method and apparatus, substrate, lithographic system and device manufacturing method
ASML NETHERLANDS BV7 citations82
US10481503B2Nov 19, 2019
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
ASML NETHERLANDS BV2 citations73
US10042268B2Aug 7, 2018
Method, apparatus and substrates for lithographic metrology
ASML NETHERLANDS BV5 citations73
US9811003B2Nov 7, 2017
Metrology method and apparatus, substrate, lithographic system and device manufacturing method
ASML NETHERLANDS BV5 citations73
US9535338B2Jan 3, 2017
Metrology method and apparatus, substrate, lithographic system and device manufacturing method
ASML NETHERLANDS BV3 citations73
US11428521B2Aug 30, 2022
Metrology method, target and substrate
ASML NETHERLANDS BV3 citations72
US10331043B2Jun 25, 2019
Optimization of target arrangement and associated target
ASML NETHERLANDS BV6 citations72
US10331041B2Jun 25, 2019
Metrology method and apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV1 citations72
US10162272B2Dec 25, 2018
Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method
ASML NETHERLANDS BV2 citations72
US10126662B2Nov 13, 2018
Metrology method and apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV2 citations72
US10739687B2Aug 11, 2020
Metrology method and apparatus, substrate, lithographic system and device manufacturing method
ASML NETHERLANDS BV4 citations71
US9879988B2Jan 30, 2018
Metrology method and apparatus, computer program and lithographic system
ASML NETHERLANDS BV4 citations70
US11181828B2Nov 23, 2021
Method of determining a value of a parameter of interest of a patterning process, device manufacturing method
ASML NETHERLANDS BV2 citations67
US12429328B2Sep 30, 2025
Metrology method, target and substrate
ASML NETHERLANDS BV0 citations62
US11466980B2Oct 11, 2022
Metrology method and apparatus, lithographic system, device manufacturing method and substrate
ASML NETHERLANDS BV0 citations62
US11092900B2Aug 17, 2021
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
ASML NETHERLANDS BV0 citations62
US11526085B2Dec 13, 2022
Metrology method and apparatus, substrate, lithographic system and device manufacturing method
ASML NETHERLANDS BV0 citations61
US11392043B2Jul 19, 2022
Method and metrology apparatus for determining estimated scattered radiation intensity
ASML NETHERLANDS BV0 citations60
US9535342B2Jan 3, 2017
Metrology method and apparatus, and device manufacturing method
ASML NETHERLANDS BV0 citations52
US9331022B2May 3, 2016
Substrate and patterning device for use in metrology, metrology method and device manufacturing method
ASML NETHERLANDS BV0 citations52
US10725386B2Jul 28, 2020
Metrology method and apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV0 citations51
US9719945B2Aug 1, 2017
Metrology method and apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV0 citations51
SMILDE HENDRIK JAN HIDDE
5 patentsUS8867020B2Oct 21, 2014
Metrology method and apparatus, and device manufacturing method
SMILDE HENDRIK JAN HIDDE59 citations97
US8411287B2Apr 2, 2013
Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrate
SMILDE HENDRIK JAN HIDDE85 citations97
US9140998B2Sep 22, 2015
Metrology method and inspection apparatus, lithographic system and device manufacturing method
SMILDE HENDRIK JAN HIDDE24 citations92
US8223347B2Jul 17, 2012
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
SMILDE HENDRIK JAN HIDDE4 citations62
US9081304B2Jul 14, 2015
Substrate, an inspection apparatus, and a lithographic apparatus
SMILDE HENDRIK JAN HIDDE1 citations51