Inventor

VAN DER SCHAAR MAURITS

NL125 patents

⚠️ This page may combine multiple inventors who share the name “VAN DER SCHAAR MAURITS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VAN DER SCHAAR MAURITS

ASML NETHERLANDS BV

Method and apparatus for angular-resolved spectroscopic lithography characterization

Method and apparatus for angular-resolved spectroscopic lithography characterization

Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement

Device inspection method and apparatus using an asymmetric marker

Lithographic apparatus

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Alignment system for lithographic apparatus for measuring a position of an alignment mark

Method and apparatus for angular-resolved spectroscopic lithography characterization

Method and apparatus for angular-resolved spectroscopic lithography characterization

Lithographic apparatus and device manufacturing method

Method and apparatus for angular-resolved spectroscopic lithography characterization

Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus

Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby

Alternative target design for metrology using modulation techniques

Metrology apparatus and method for determining a characteristic of one or more structures on a substrate

Metrology method and apparatus, lithographic system, device manufacturing method and substrate

Substrate, a method of measuring a property, an inspection apparatus and a lithographic apparatus

Method of determining overlay error and a device manufacturing method

Method and apparatus for angular-resolved spectroscopic lithography characterization

Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatus

Method of measurement, an inspection apparatus and a lithographic apparatus

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methods

Method and apparatus for angular-resolved spectroscopic lithography characterization

Alignment tool for a lithographic apparatus

Metrology method, target and substrate

Metrology method, target and substrate

Method and apparatus for design of a metrology target

Metrology method, target and substrate

Method and apparatus for angular-resolved spectroscopic lithography characterization

Metrology method and apparatus, lithographic system and device manufacturing method

Metrology method and apparatus, and device manufacturing method

Device manufacturing method and computer program product

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Marker structure and method for controlling alignment of layers of a multi-layered substrate

Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method

Lithographic apparatus and device manufacturing method using overlay measurement

Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby

Lithographic apparatus

Lithographic apparatus

Lithographic apparatus, device manufacturing method, and device manufactured thereby

Computer program for determining a corrected position of a measured alignment mark, device manufacturing method, and device manufactured thereby

Metrology apparatus and method for determining a characteristic of one or more structures on a substrate

Method and apparatus for design of a metrology target

Method and apparatus for angular-resolved spectroscopic lithography characterization

VAN DE KERKHOF MARCUS ADRIANUS

Inspection apparatus for lithography

Apparatus and method of measuring a property of a substrate

MOS EVERHARDUS CORNELIS

Alignment system, lithographic system and method

VAN DER SCHAAR MAURITS

Method of measurement, an inspection apparatus and a lithographic apparatus

DEN BOEF ARIE JEFFREY MARIA

Method and apparatus for angular-resolved spectroscopic lithography characterization

DEN BOEF ARIE JEFFREY

Method and apparatus for determining an overlay error