Inventor
KUBIS MICHAEL
DE30 patents
⚠️ This page may combine multiple inventors who share the name “KUBIS MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
22 patentsUS9946167B2Apr 17, 2018
Metrology method and inspection apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV18 citations94
US8994944B2Mar 31, 2015
Methods and scatterometers, lithographic systems, and lithographic processing cells
ASML NETHERLANDS BV24 citations92
US11204239B2Dec 21, 2021
Metrology method, target and substrate
ASML NETHERLANDS BV7 citations83
US10718604B2Jul 21, 2020
Metrology method, target and substrate
ASML NETHERLANDS BV6 citations83
US10386176B2Aug 20, 2019
Metrology method, target and substrate
ASML NETHERLANDS BV5 citations83
US9291916B2Mar 22, 2016
Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methods
ASML NETHERLANDS BV5 citations83
US9158194B2Oct 13, 2015
Metrology method and apparatus, and device manufacturing method
ASML NETHERLANDS BV9 citations83
US11428521B2Aug 30, 2022
Metrology method, target and substrate
ASML NETHERLANDS BV3 citations72
US11385553B2Jul 12, 2022
Metrology method, patterning device, apparatus and computer program
ASML NETHERLANDS BV2 citations72
US10996570B2May 4, 2021
Metrology method, patterning device, apparatus and computer program
ASML NETHERLANDS BV2 citations72
US9454084B2Sep 27, 2016
Method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement system
ASML NETHERLANDS BV5 citations72
US11170072B2Nov 9, 2021
Method and apparatus for inspection and metrology
ASML NETHERLANDS BV2 citations70
US12429328B2Sep 30, 2025
Metrology method, target and substrate
ASML NETHERLANDS BV0 citations62
USRE49460EMar 14, 2023
Inspection method and apparatus and lithographic processing cell
ASML NETHERLANDS BV0 citations60
USRE49199ESep 6, 2022
Inspection method and apparatus and lithographic processing cell
ASML NETHERLANDS BV0 citations60
US8887107B2Nov 11, 2014
Inspection method and apparatus and lithographic processing cell
ASML NETHERLANDS BV2 citations60
US11048174B2Jun 29, 2021
Method of controlling a patterning process, lithographic apparatus, metrology apparatus lithographic cell and associated computer program
ASML NETHERLANDS BV1 citations56
US12547815B2Feb 10, 2026
Multiscale physical etch modeling and methods thereof
ASML NETHERLANDS BV0 citations54
US10634490B2Apr 28, 2020
Determining edge roughness parameters
ASML NETHERLANDS BV0 citations52
US9331022B2May 3, 2016
Substrate and patterning device for use in metrology, metrology method and device manufacturing method
ASML NETHERLANDS BV0 citations52
US10915689B2Feb 9, 2021
Method and apparatus to correct for patterning process error
ASML NETHERLANDS BV0 citations49
US9163935B2Oct 20, 2015
Device manufacturing method and associated lithographic apparatus, inspection apparatus, and lithographic processing cell
ASML NETHERLANDS BV0 citations42