Inventor
JAK MARTIN JACOBUS JOHAN
NL49 patents
⚠️ This page may combine multiple inventors who share the name “JAK MARTIN JACOBUS JOHAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
34 patentsUS10527953B2Jan 7, 2020
Metrology recipe selection
ASML NETHERLANDS BV5 citations84
US10379445B2Aug 13, 2019
Metrology method, target and substrate
ASML NETHERLANDS BV13 citations84
US10133188B2Nov 20, 2018
Metrology method, target and substrate
ASML NETHERLANDS BV10 citations84
US11204239B2Dec 21, 2021
Metrology method, target and substrate
ASML NETHERLANDS BV7 citations83
US10718604B2Jul 21, 2020
Metrology method, target and substrate
ASML NETHERLANDS BV6 citations83
US10386176B2Aug 20, 2019
Metrology method, target and substrate
ASML NETHERLANDS BV5 citations83
US10481506B2Nov 19, 2019
Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV7 citations82
US11385552B2Jul 12, 2022
Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV2 citations73
US10831109B2Nov 10, 2020
Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV5 citations73
US10338401B2Jul 2, 2019
Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method
ASML NETHERLANDS BV2 citations73
US10289008B2May 14, 2019
Methods and apparatus for predicting performance of a measurement method, measurement method and apparatus
ASML NETHERLANDS BV6 citations73
US10042268B2Aug 7, 2018
Method, apparatus and substrates for lithographic metrology
ASML NETHERLANDS BV5 citations73
US9811003B2Nov 7, 2017
Metrology method and apparatus, substrate, lithographic system and device manufacturing method
ASML NETHERLANDS BV5 citations73
US9535338B2Jan 3, 2017
Metrology method and apparatus, substrate, lithographic system and device manufacturing method
ASML NETHERLANDS BV3 citations73
US11428521B2Aug 30, 2022
Metrology method, target and substrate
ASML NETHERLANDS BV3 citations72
US11009343B2May 18, 2021
Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
ASML NETHERLANDS BV2 citations72
US10162272B2Dec 25, 2018
Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method
ASML NETHERLANDS BV2 citations72
US9940703B2Apr 10, 2018
Method of measuring a property of a target structure, inspection apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV4 citations72
US9633427B2Apr 25, 2017
Method of measuring a property of a target structure, inspection apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV2 citations72
US10635004B2Apr 28, 2020
Correction using stack difference
ASML NETHERLANDS BV3 citations71
US10656534B2May 19, 2020
Method of measuring, device manufacturing method, metrology apparatus, and lithographic system
ASML NETHERLANDS BV2 citations68
US8742381B2Jun 3, 2014
Radiation source with cleaning apparatus
ASML NETHERLANDS BV3 citations63
US7952084B2May 31, 2011
Radiation source and lithographic apparatus
ASML NETHERLANDS BV2 citations63
US12429328B2Sep 30, 2025
Metrology method, target and substrate
ASML NETHERLANDS BV0 citations62
US11650047B2May 16, 2023
Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
ASML NETHERLANDS BV0 citations62
US11106142B2Aug 31, 2021
Metrology recipe selection
ASML NETHERLANDS BV0 citations62
US10656533B2May 19, 2020
Metrology in lithographic processes
ASML NETHERLANDS BV1 citations62
US10310389B2Jun 4, 2019
Method of measuring, device manufacturing method, metrology apparatus, and lithographic system
ASML NETHERLANDS BV1 citations61
US11300883B2Apr 12, 2022
Method to determine a patterning process parameter
ASML NETHERLANDS BV0 citations58
US10551308B2Feb 4, 2020
Focus control arrangement and method
ASML NETHERLANDS BV1 citations57
US10634490B2Apr 28, 2020
Determining edge roughness parameters
ASML NETHERLANDS BV0 citations52
US10620550B2Apr 14, 2020
Metrology method and apparatus
ASML NETHERLANDS BV0 citations52
US9753296B2Sep 5, 2017
Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method
ASML NETHERLANDS BV1 citations52
US9163935B2Oct 20, 2015
Device manufacturing method and associated lithographic apparatus, inspection apparatus, and lithographic processing cell
ASML NETHERLANDS BV0 citations42
SOER WOUTER ANTHON
6 patentsUS8263950B2Sep 11, 2012
Radiation source
SOER WOUTER ANTHON2 citations61
US9041912B2May 26, 2015
Spectral purity filters for use in a lithographic apparatus
SOER WOUTER ANTHON3 citations60
US9195152B2Nov 24, 2015
Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
SOER WOUTER ANTHON3 citations57
US9726989B2Aug 8, 2017
Spectral purity filter
SOER WOUTER ANTHON0 citations52
US8817237B2Aug 26, 2014
Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
SOER WOUTER ANTHON0 citations52
US8390788B2Mar 5, 2013
Spectral purity filters for use in a lithographic apparatus
SOER WOUTER ANTHON0 citations49