Inventor

LEE HSIEN-MING

TW71 patents

⚠️ This page may combine multiple inventors who share the name “LEE HSIEN-MING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LEE HSIEN-MING

TAIWAN SEMICONDUCTOR MFG CO LTD

Formation and in-situ etching processes for metal layers

Semiconductor device with metal gate structure comprising work-function metal layer and work-fuction adjustment layer

Gate structure passivating species drive-in method and structure formed thereby

Gate structure passivating species drive-in method and structure formed thereby

Capping layers in metal gates of transistors

Semiconductor device and method of manufacture

Selective hybrid capping layer for metal gates of transistors

Gate resistance reduction through low-resistivity conductive layer

Semiconductor device with profiled work-function metal gate electrode and method of making

Semiconductor device with profiled work-function metal gate electrode and method of making

Formation and in-situ etching processes for metal layers

Semiconductor device and method for fabricating the same

Metal gate structure with multi-layer composition

Gate structure passivating species drive-in method and structure formed thereby

Void elimination for gap-filling in high-aspect ratio trenches

CMOS FinFET structures including work-function materials having different proportions of crystalline orientations and methods of forming the same

Semiconductor device and method

Selective hybrid capping layer for metal gates of transistors

Semiconductor device with profiled work-function metal gate electrode and method of making

Formation and in-situ etching processes for metal layers

Semiconductor device and method of manufacture

Semiconductor device and method of manufacture

Gate resistance reduction through low-resistivity conductive layer

Semiconductor device with profiled work-function metal gate electrode and method of making

Semiconductor device and method

Semiconductor device and method of manufacture

Semiconductor device and method

Transistor metal gate and method of manufacture

Metal gate structure with multi-layer composition

Gate structure passivating species drive-in method and structure formed thereby

Semiconductor device and method of manufacturing the same

Method of tuning threshold voltages of transistors

Semiconductor device and method of manufacturing the same

Method of tuning threshold voltages of transistors

Semiconductor device and method for fabricating the same

Semiconductor device and method of manufacturing the same

Void elimination for gap-filling in high-aspect ratio trenches

CMOS FinFET structures including work-function materials having different proportions of crystalline orientations and methods of forming the same

TAIWAN SEMICONDUCTOR MFG

Barrier structure for semiconductor devices

Method of forming a robust copper interconnect by dilute metal doping

N metal for FinFET

High performance metallization cap layer

Method for simultaneous degas and baking in copper damascene process

Refractory metal nitride barrier layer with gradient nitrogen concentration

N metal for FinFET and methods of forming

Composite barrier layer

ABILITY ENTPR CO LTD

Clamper and device using the same

Clamping fixture

LIN YU-FANG

Signal transmission device

ACADEMIA SINICA

Synthetic polypeptides and uses thereof