Inventor
FAN CHIH-HSIANG
TW11 patents
⚠️ This page may combine multiple inventors who share the name “FAN CHIH-HSIANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
7 patentsUS11610982B2Mar 21, 2023
Void elimination for gap-filling in high-aspect ratio trenches
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US10804161B2Oct 13, 2020
CMOS FinFET structures including work-function materials having different proportions of crystalline orientations and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations70
US12100751B2Sep 24, 2024
Void elimination for gap-filling in high-aspect ratio trenches
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11961768B2Apr 16, 2024
CMOS FinFET structures including work-function materials having different proportions of crystalline orientations and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11682589B2Jun 20, 2023
CMOS finFET structures including work-function materials having different proportions of crystalline orientations and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12431356B2Sep 30, 2025
Metal gate structure and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US10515807B1Dec 24, 2019
Methods of fabricating semiconductor devices with metal-gate work-function tuning layers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49