Inventor
HYTHA MAREK
US69 patents
⚠️ This page may combine multiple inventors who share the name “HYTHA MAREK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ATOMERA INC
27 patentsUS10453945B2Oct 22, 2019
Semiconductor device including resonant tunneling diode structure having a superlattice
ATOMERA INC45 citations98
US10276625B1Apr 30, 2019
CMOS image sensor including superlattice to enhance infrared light absorption
ATOMERA INC54 citations98
US10249745B2Apr 2, 2019
Method for making a semiconductor device including a resonant tunneling diode structure having a superlattice
ATOMERA INC52 citations98
US10170604B2Jan 1, 2019
Method for making a semiconductor device including a resonant tunneling diode with electron mean free path control layers
ATOMERA INC60 citations98
US10170603B2Jan 1, 2019
Semiconductor device including a resonant tunneling diode structure with electron mean free path control layers
ATOMERA INC61 citations98
US10109479B1Oct 23, 2018
Method of making a semiconductor device with a buried insulating layer formed by annealing a superlattice
ATOMERA INC82 citations98
US10566191B1Feb 18, 2020
Semiconductor device including superlattice structures with reduced defect densities
ATOMERA INC51 citations95
US10868120B1Dec 15, 2020
Method for making a varactor with hyper-abrupt junction region including a superlattice
ATOMERA INC31 citations94
US10854717B2Dec 1, 2020
Method for making a FINFET including source and drain dopant diffusion blocking superlattices to reduce contact resistance
ATOMERA INC32 citations94
US10847618B2Nov 24, 2020
Semiconductor device including body contact dopant diffusion blocking superlattice having reduced contact resistance
ATOMERA INC33 citations94
US10840388B1Nov 17, 2020
Varactor with hyper-abrupt junction region including a superlattice
ATOMERA INC33 citations94
US10840335B2Nov 17, 2020
Method for making semiconductor device including body contact dopant diffusion blocking superlattice to reduce contact resistance
ATOMERA INC31 citations94
US10840336B2Nov 17, 2020
Semiconductor device with metal-semiconductor contacts including oxygen insertion layer to constrain dopants and related methods
ATOMERA INC31 citations94
US10840337B2Nov 17, 2020
Method for making a FINFET having reduced contact resistance
ATOMERA INC31 citations94
US10825901B1Nov 3, 2020
Semiconductor devices including hyper-abrupt junction region including a superlattice
ATOMERA INC32 citations94
US10825902B1Nov 3, 2020
Varactor with hyper-abrupt junction region including spaced-apart superlattices
ATOMERA INC30 citations94
US10818755B2Oct 27, 2020
Method for making semiconductor device including source/drain dopant diffusion blocking superlattices to reduce contact resistance
ATOMERA INC33 citations94
US10811498B2Oct 20, 2020
Method for making superlattice structures with reduced defect densities
ATOMERA INC35 citations94
US10727049B2Jul 28, 2020
Method for making a semiconductor device including compound semiconductor materials and an impurity and point defect blocking superlattice
ATOMERA INC30 citations94
US10593761B1Mar 17, 2020
Method for making a semiconductor device having reduced contact resistance
ATOMERA INC51 citations94
US10580866B1Mar 3, 2020
Semiconductor device including source/drain dopant diffusion blocking superlattices to reduce contact resistance
ATOMERA INC49 citations94
US10580867B1Mar 3, 2020
FINFET including source and drain regions with dopant diffusion blocking superlattice layers to reduce contact resistance
ATOMERA INC49 citations94
US10468245B2Nov 5, 2019
Semiconductor device including compound semiconductor materials and an impurity and point defect blocking superlattice
ATOMERA INC46 citations94
US10361243B2Jul 23, 2019
Method for making CMOS image sensor including superlattice to enhance infrared light absorption
ATOMERA INC44 citations94
US11978771B2May 7, 2024
Gate-all-around (GAA) device including a superlattice
ATOMERA INC7 citations86
US11923418B2Mar 5, 2024
Semiconductor device including a superlattice and enriched silicon 28 epitaxial layer
ATOMERA INC7 citations86
US11848356B2Dec 19, 2023
Method for making semiconductor device including superlattice with oxygen and carbon monolayers
ATOMERA INC6 citations86
RJ MEARS LLC
13 patentsUS7265002B2Sep 4, 2007
Method for making a semiconductor device including a MOSFET having a band-engineered superlattice with a semiconductor cap layer providing a channel
RJ MEARS LLC114 citations99
US7071119B2Jul 4, 2006
Method for making a semiconductor device including band-engineered superlattice having 3/1-5/1 germanium layer structure
RJ MEARS LLC112 citations99
US7033437B2Apr 25, 2006
Method for making semiconductor device including band-engineered superlattice
RJ MEARS LLC110 citations99
US7034329B2Apr 25, 2006
Semiconductor device including band-engineered superlattice having 3/1-5/1 germanium layer structure
RJ MEARS LLC114 citations99
US6958486B2Oct 25, 2005
Semiconductor device including band-engineered superlattice
RJ MEARS LLC114 citations99
US6952018B2Oct 4, 2005
Semiconductor device including band-engineered superlattice
RJ MEARS LLC112 citations99
US6927413B2Aug 9, 2005
Semiconductor device including band-engineered superlattice
RJ MEARS LLC113 citations99
US6897472B2May 24, 2005
Semiconductor device including MOSFET having band-engineered superlattice
RJ MEARS LLC153 citations99
US6891188B2May 10, 2005
Semiconductor device including band-engineered superlattice
RJ MEARS LLC123 citations99
US6833294B1Dec 21, 2004
Method for making semiconductor device including band-engineered superlattice
RJ MEARS LLC127 citations99
US6830964B1Dec 14, 2004
Method for making semiconductor device including band-engineered superlattice
RJ MEARS LLC136 citations99
US7153763B2Dec 26, 2006
Method for making a semiconductor device including band-engineered superlattice using intermediate annealing
RJ MEARS LLC119 citations98
US6878576B1Apr 12, 2005
Method for making semiconductor device including band-engineered superlattice
RJ MEARS LLC117 citations97
MEARS TECHNOLOGIES INC
9 patentsUS7435988B2Oct 14, 2008
Semiconductor device including a MOSFET having a band-engineered superlattice with a semiconductor cap layer providing a channel
MEARS TECHNOLOGIES INC110 citations99
US7303948B2Dec 4, 2007
Semiconductor device including MOSFET having band-engineered superlattice
MEARS TECHNOLOGIES INC110 citations99
US7880161B2Feb 1, 2011
Multiple-wavelength opto-electronic device including a superlattice
MEARS TECHNOLOGIES INC121 citations98
US7863066B2Jan 4, 2011
Method for making a multiple-wavelength opto-electronic device including a superlattice
MEARS TECHNOLOGIES INC110 citations97
US7718996B2May 18, 2010
Semiconductor device comprising a lattice matching layer
MEARS TECHNOLOGIES INC110 citations97
US7700447B2Apr 20, 2010
Method for making a semiconductor device comprising a lattice matching layer
MEARS TECHNOLOGIES INC113 citations97
US7625767B2Dec 1, 2009
Methods of making spintronic devices with constrained spintronic dopant
MEARS TECHNOLOGIES INC117 citations97
US7517702B2Apr 14, 2009
Method for making an electronic device including a poled superlattice having a net electrical dipole moment
MEARS TECHNOLOGIES INC130 citations97
US7446002B2Nov 4, 2008
Method for making a semiconductor device comprising a superlattice dielectric interface layer
MEARS TECHNOLOGIES INC120 citations97
MEARS ROBERT J
1 patentShowing the top 50 of 69 patents by PatentIndex Score.